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Thin plasma polymerised coatings for corrosion protection against strong alkaline solutions

机译:薄的等离子体聚合涂料,用于耐腐蚀抗碱性溶液

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Thin plasma polymers were applied on gold- and aluminium substrates using low pressure microwave- and radiofrequency-excited hexamethyldisilazane (HMDSN) plasma. The corrosion resistance properties of these coatings against sodium hydroxide solution (NaOH) was characterised by means of time resolved electrochemical impedance spectroscopy (EIS) and light microscopy. The evaluated resistance values were correlated with coating topography, chemical composition, wetting properties, and morphology with particular focus on porosity. Coating porosity was determined by using cyclic voltammetry (CV) and light microscopy. The topography and chemistry of the coatings were characterised by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The wetting properties were determined by optical contact angle (OCA) measurements. It is shown that the plasma polymer's resistance against NaOH can be greatly increased by lowering the energy input during the deposition process. This can be attributed to the strong correlation between porosity and resistivity: low energy input during plasma deposition leads to the formation of smaller and more uniform particles in the plasma bulk and possibly a Stranski-Krastanov growth of the layers, resulting in a smoother coating topography and lower nano-porosity. A more dense and compact coating morphology leads to a better corrosion protection performance.
机译:使用低压微波和射频激发的六甲基二硅氮烷(HMDSN)血浆施加薄的等离子体聚合物。通过定位的电化学阻抗光谱(EIS)和光学显微镜,表征了这些涂层对氢氧化钠溶液(NaOH)的耐腐蚀性能。评估的电阻值与涂层形貌,化学成分,润湿性能和形态相关,特别关注孔隙率。通过使用循环伏安法(CV)和光学显微镜测定涂层孔隙率。涂层的形貌和化学以原子力显微镜(AFM)和X射线光电子能谱(XPS)为特征。通过光学接触角(OCA)测量测定润湿性能。结果表明,通过降低沉积过程中的能量输入,可以大大增加血浆聚合物对NaOH的阻力。这可以归因于孔隙率和电阻率之间的强相关性:等离子体沉积期间的低能量输入导致血浆散装中的较小且更均匀的颗粒,并且可能是层的斯特拉斯基krastanov生长,导致更平滑的涂层形貌纳米孔隙率低。更密集和紧凑的涂层形态导致更好的防腐蚀性性能。

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