首页> 外文期刊>The Journal of Organic Chemistry >Rhodium(III)-Catalyzed Oxidative Coupling of N-Phenylindole-3-carboxylic Acids with Alkenes and Alkynes via C4–H and C2–H/C2′–H Bond Cleavage
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Rhodium(III)-Catalyzed Oxidative Coupling of N-Phenylindole-3-carboxylic Acids with Alkenes and Alkynes via C4–H and C2–H/C2′–H Bond Cleavage

机译:通过C4-H和C2-H / C2'-H键裂解铑(III)与烯基吲哚-3-羧酸的催化氧化偶联 n℃和炔基-3-羧酸

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摘要

The rhodium(III)-catalyzed direct alkenylation of N -phenylindole-3-carboxylic acids with alkenes including acrylate ester, acrylamide, and acrylonitrile proceeds smoothly at the C4-position through regioselective C–H bond cleavage directed by the carboxyl group. In marked contrast, the indole substrates react with diarylacetylenes accompanied by cleavage of the C2–H and C2′–H bonds and decarboxylation to produce 5,6-diarylindolo[1,2-a ]quinolone derivatives. DFT calculations have suggested that the smooth insertion of an alkene to a C4-rhodated six-membered metallacycle intermediate leads to the C4 alkenylated products, while the latter annulation at the C2- and C2′-positions is attributable to facile reductive elimination in the corresponding seven-membered metallacycles formed by the double C–H bond cleavage and alkyne insertion.
机译:通过由羧基指导的区域选择性C-H键切割在C4位置在C4 - 位置在C4 - 位置进入烷烃的铑(III)的催化剂(III)的直接链烯化酶,其与烯烃酯,丙烯酸酯,丙烯腈在C4位置顺利进行。 。 在标记的对比中,吲哚底物与二芳基乙炔反应,伴随着C 2-H和C2'-H键的裂解和脱羧,以产生5,6-二芳基醇[1,2- A]喹啉衍生物。 DFT计算表明,烯烃的平滑插入C4罗胺六元冶金中间体导致C4链烯基化产物,而C2-和C2'-位置的后一种环节可归因于相应的相应的重新消除 由双C-H键切割和炔烃插入形成的七元金属间金属间金属间金属间隙。

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  • 来源
    《The Journal of Organic Chemistry》 |2018年第10期|共11页
  • 作者单位

    Department of Applied Chemistry Graduate School of Engineering Osaka University Suita Osaka 565-0871 Japan;

    Department of Chemistry Graduate School of Science Osaka City University 3-3-138 Sugimoto Sumiyoshi-ku Osaka 558-8585 Japan;

    Department of Applied Chemistry Graduate School of Engineering Osaka University Suita Osaka 565-0871 Japan;

    Department of Chemistry Graduate School of Science Osaka City University 3-3-138 Sugimoto Sumiyoshi-ku Osaka 558-8585 Japan;

    Department of Chemical Science and Engineering School of Materials and Chemical Technology Tokyo Institute of Technology Ookayama Meguro-ku Tokyo 152-8552 Japan;

    Department of Chemical Science and Engineering School of Materials and Chemical Technology Tokyo Institute of Technology Ookayama Meguro-ku Tokyo 152-8552 Japan;

    Department of Applied Chemistry Graduate School of Engineering Osaka University Suita Osaka 565-0871 Japan;

    Department of Applied Chemistry Graduate School of Engineering Osaka University Suita Osaka 565-0871 Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 有机化学;
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