首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Oxygen Vacancy in Wurtzite ZnO and Metal-Supported ZnO/M(111) Bilayer Films (M = Cu, Ag and Au)
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Oxygen Vacancy in Wurtzite ZnO and Metal-Supported ZnO/M(111) Bilayer Films (M = Cu, Ag and Au)

机译:紫硝钛矿ZnO和金属负载ZnO / M(111)双层膜(M = Cu,Ag和Au)中的氧气空位

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摘要

Using spin-polarized DFT+U calculations we have studied the nature of the O vacancy in graphitic-like ZnO bilayer films supported on Cu, Ag, and Au (111) surfaces and compared it with the same defect center formed on free-standing ZnO bilayers and on the ZnO wurtzite (10 (1) over bar0) surface. The formation energy of the oxygen vacancy is similar in bulk ZnO wurtzite and in free-standing ZnO bilayers, about 4.3 eV, while it is about 1 eV smaller on the wurtzite (10 (1) over bar0) surface. The analysis of the density of states, electron density, and charge distribution, shows that the two excess electrons associated with the vacancy are localized at the vacancy site in all these systems. The situation is more complex on the bilayer films on metal. Removing oxygen from the top layer of ZnO/Cu(111) and ZnO/Ag(111) results in charge delocalization over the entire ZnO film, no charge transfer to the support, and the formation energy remains high, as for the unsupported layer, about 4.2 eV. In the case of ZnO/Au(111), however, due to the higher work function of Au, electrons are transferred from the oxide top layer to the metal, and the cost to remove oxygen is strongly reduced by 1.7 eV. For all ZnO/metal supported films, the formation energy of the vacancy is reduced at the metal/oxide interface, showing the important role that metal/oxide interfaces have in determining the reducibility of an oxide. Beside electronic effects, the local structural distortions of the ZnO thin films and the metal support also contribute to reduce the oxygen vacancy's formation energy.
机译:使用旋转极化DFT + U计算,我们研究了Cu,Ag和Au(111)表面支持的石墨样ZnO双层膜中的o空位的性质,并将其与在独立式ZnO上形成的相同缺陷中心进行比较双层和ZnO vutzite(10(1)克拉0)表面。氧气空位的形成能量在散装ZnO紫硝基钛矿中类似,在单层双层双层,约4.3eV,紫立岩(10(1)上)表面上的约1eV较小。分析状态的密度,电子密度和电荷分布,表明与空位相关的两个过量的电子在所有这些系统中的空位位点局部化。在金属上的双层电影上的情况更复杂。从ZnO / Cu(111)的顶层和ZnO / Ag(111)中除去氧气导致整个ZnO膜上的电荷描移,没有充电转移到载体,形成能量保持高,如不受支持的层,大约4.2 ev。然而,在ZnO / AU(111)的情况下,由于Au的较高功函数,电子从氧化物顶层转移到金属,并且去除氧的成本强烈减少1.7eV。对于所有ZnO /金属支撑的薄膜,空位的形成能量在金属/氧化物界面处减少,显示金属/氧化物界面在确定氧化物的再减少性方面的重要作用。除电子效果外,ZnO薄膜和金属支撑件的局部结构扭曲还有助于降低氧气空位的形成能量。

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