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Enhancing the stability of the electron density in electrochemically doped ZnO quantum dots

机译:提高电化学掺杂ZnO量子点中的电子密度的稳定性

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摘要

Electronic doping of semiconductor nanomaterials can be efficiently achieved using electrochemistry. However, the injected charge carriers are usually not very stable. After disconnecting the cell that is used for electrochemical doping, the carrier density drops, typically in several minutes. While there are multiple possible causes for this, we demonstrate here using n-doped ZnO quantum-dot (QD) films of variable thickness that the dominant mechanism is reduction of solvent impurities by the injected electrons. We subsequently investigate two different ways to enhance the doping stability of ZnO QD films. The first method uses preemptive reduction of the solvent impurities; the second method involves a solid covering the QD film, which hinders impurity diffusion to the film. Both methods enhance the doping stability of the QD films greatly. Published under license by AIP Publishing.
机译:可以使用电化学有效地实现半导体纳米材料的电子掺杂。 然而,注入的电荷载流子通常不是很稳定。 在断开用于电化学掺杂的电池的电池之后,通常在几分钟内下降,载流子密度下降。 虽然有多种可能的原因,但我们在这里使用N掺杂的ZnO量子点(QD)薄膜的可变厚度,所以通过喷射的电子还原溶剂杂质。 我们随后研究了两种不同的方式来提高ZnO QD膜的掺杂稳定性。 第一种方法采用溶剂杂质的先发制物减少; 第二种方法涉及覆盖QD膜的固体,其阻碍杂质扩散到薄膜。 两种方法都提高了QD膜的掺杂稳定性。 通过AIP发布在许可证下发布。

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