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首页> 外文期刊>Polymer: The International Journal for the Science and Technology of Polymers >Low dielectric constant silica-containing cross-linked organic-inorganic materials based on fluorinated poly(arylene ether)s
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Low dielectric constant silica-containing cross-linked organic-inorganic materials based on fluorinated poly(arylene ether)s

机译:基于氟化聚(亚芳基醚)的低介电常数二氧化硅的交联有机 - 无机材料

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In this work, for the first time, we describe the design and synthesis of novel fluorinated poly(arylene ether)/silica cross-linked materials (FPAE/SiO1.5) through a sol-gel process by using the triethoxysilyl-containing fluorinated polyethers as precursors for both organic and inorganic networks formation. The polyether-based precursors with the sol-gel active species were synthesized via hydrosilylation reaction between triethoxysilane and the corresponding allyl-functionalized FPAE under Pt catalysis. Herein, we present two approaches of hydrolysis triethoxysilane groups to silanol ones within sol-gel chemistry: (1) hydrolysis with air moisture and (2) hydrolysis of the ethoxysilyl groups at the interface between two liquids. The mechanical and thermal properties of the FPAE/SiO1.5 materials were studied depending on the structure of macromolecular chains and synthetic route. Scanning electron and atomic force microscopies were employed to investigate the morphology of the resulting silica-containing cross-linked materials. The resulting FPAE/SiO1.5 films were flexible and tough with tensile strength above 25 MPa, and exhibited high thermal stability, having the initial decomposition temperature about 300 degrees C. For more detailed explanation of the thermophysical behavior of the FPAE/SiO1.5 materials, the synthesis method of new silica-containing organic-inorganic system was developed by the direct hydrosilylation reaction between allyl-functionalized polyethers and 1,1,3,3-tetramethyldisiloxane. All films exhibited high hydrophobic properties (water contact angles above 102 degrees), low dielectric constants and losses at room temperature. In particular, the FPAE/SiO1.5 film prepared from tetrafluorobenzene-based polyether showed the ultra-low dielectric constant of 1.86 at 10 kHz. This makes the obtained polymer FPAE/SiO1.5 materials attractive for microelectronics and many other emerging applications.
机译:在这项工作中,我们首次描述了通过使用含三乙氧基甲硅烷基的氟化聚醚的溶胶 - 凝胶法来描述新的氟化聚(亚芳基醚)/二氧化硅交联材料(FPAE / SiO1.5)的设计和合成作为有机和无机网络形成的前体。通过三乙氧基硅烷和相应的烯丙基官能化FPAE在PT催化下通过氢化硅烷化反应合成具有溶胶 - 凝胶活性物质的基于聚醚的前体。在此,我们向溶胶 - 凝胶化学中的硅烷醇中的两种水解三乙氧基硅烷基团:(1)用空气水分和(2)在两个液体之间的界面处的乙氧基甲硅烷基的水解。根据大分子链和合成途径的结构研究了FPAE / SiO1.5材料的机械和热性能。采用扫描电子和原子力显微镜来研究所得二氧化硅的交联材料的形态。得到的FPAE / SiO1.5薄膜具有柔韧性且坚韧,抗拉强度高于25MPa,并且具有高热稳定性,具有约300℃的初始分解温度。对于FPAE / SiO1的热神经性行为的更详细说明。材料,通过烯丙基官能化聚醚和1,1,3,3-四甲基二硅氧烷之间的直接氢化硅烷化反应产生新的含二氧化硅的有机无机系统的合成方法。所有薄膜在室温下表现出高疏水性质(高于102度的水接触角),低介电常数和室温损失。特别地,由四氟苯基的聚醚制备的FPAE / SiO1.5薄膜显示出10kHz的超低介电常数为1.86。这使得获得的聚合物FPAE / SiO1.5材料对微电子和许多其他新兴应用具有吸引力。

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