...
首页> 外文期刊>Physics of plasmas >Formation of annular plasma downstream by magnetic aperture in the helicon experimental device
【24h】

Formation of annular plasma downstream by magnetic aperture in the helicon experimental device

机译:直升机实验装置中磁孔径下游形成环状等离子体

获取原文
获取原文并翻译 | 示例

摘要

In the Helicon eXperimental (HeX) device, the geometric aperture is fixed, but the position of the magnetic aperture can be varied. Working with Argon gas in the pressure range of 1 - 10 x 10(-4) mbar, an annular plasma (density similar to 10(16) m(-3)) is formed downstream, always in front of the magnetic aperture. This occurs irrespective of the relative position of the geometric aperture or the presence of a radial electric field. This is in contrary to the earlier proposition made by others that a radial electric field is necessary to produce a hollow plasma profile. Instead, the ionization of neutrals in the radially outer region by the tail electrons, rotating fast due to gradient-B drift in the azimuthal direction, seems to account for the observed off-axis density peaking in the present experiment. This also explains the variation of the plasma annulus diameter seen here by changing the input radio frequency power (100 - 800W). Published by AIP Publishing.
机译:在直升机实验(十六进制)装置中,几何孔是固定的,但是可以改变磁孔径的位置。 使用氩气在1 - 10×10(-4)毫巴的压力范围内,在下游形成环形等离子体(相对于10(16)(-3)),总是在磁孔径的前面。 不管几何孔径的相对位置还是径向电场的存在而发生这种情况。 这违背了他人提前的命题,以至于产生中空等离子体轮廓所必需的径向电场。 相反,通过尾电子通过尾部电子在径向外部区域中的中性学电离,由于梯度-b在方位角方向上漂移而旋转,似乎考虑了本实验中观察到的轴外密度峰值。 这还解释了通过改变输入射频功率(100-800W)所见于此的等离子体环径的变化。 通过AIP发布发布。

著录项

  • 来源
    《Physics of plasmas》 |2017年第2期|共6页
  • 作者单位

    HBNI Inst Plasma Res Bhat 382428 Gandhinagar India;

    HBNI Inst Plasma Res Bhat 382428 Gandhinagar India;

    HBNI Inst Plasma Res Bhat 382428 Gandhinagar India;

    HBNI Inst Plasma Res Bhat 382428 Gandhinagar India;

    HBNI Inst Plasma Res Bhat 382428 Gandhinagar India;

    Saha Inst Nucl Phys I-AF Bidhannagar Kolkata 700064 India;

    HBNI Inst Plasma Res Bhat 382428 Gandhinagar India;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 等离子体物理学;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号