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Surface morphology and a dynamic scaling analysis in epitaxial growth: A kinetic Monte Carlo study

机译:外延生长中的表面形态与动态缩放分析:动力学蒙特卡罗研究

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We use Kinetic Monte-Carlo (KMC) simulations based on the solid-on-solid model to see the evolution of the surface morphology for different materials. We have performed a qualitative and quantitative study of the homo-epitaxial growth for (Cu, Co, Ge, and GaAs) over a large range of temperature, varying between 300 K and 700 K. Based on the growth morphology, we found two sets of materials. This classification is also confirmed by the analysis of their dynamic scaling properties (measurements of the critical exponents derived from the height-height correlation functions). Our results were compared to the available experimental and theoretical results and seem advantageous for the understanding of the growth dynamics. Different atomistic mechanisms may intervene in favoring adatoms attachment to surface steps. Here we have focused on the effect of the Ehrlich-Schwoebel barrier. However, we discussed how the magnitude of this barrier affects the scaling exponents as well as the surface morphology. (C) 2019 Elsevier B.V. All rights reserved.
机译:我们使用基于固体模型的动力学Monte-Carlo(KMC)模拟,看看不同材料的表面形态的演变。我们已经在大范围的温度下进行了对(Cu,Co,Ge和GaAs)的同源外延生长的定性和定量研究,从300k和700k之间变化。基于生长形态,我们发现了两套材料。还通过分析它们的动态缩放属性(从高度高度相关函数导出的临界指数的测量)来确认该分类。我们的结果与可用的实验和理论结果进行了比较,似乎有利于了解生长动态。不同的原子机制可以干预有利于拟合附着到表面步骤的附着物。在这里,我们专注于Ehrlich-Schwoebel屏障的影响。然而,我们讨论了这种障碍的大小如何影响缩放指数以及表面形态。 (c)2019 Elsevier B.v.保留所有权利。

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