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Analysis of epoxy functionalized layers synthesized by plasma polymerization of allyl glycidyl ether

机译:烯丙基缩水甘油醚等离子体聚合合成的环氧官能化层分析

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摘要

The deposition of epoxide groups by plasma polymerization opens new horizons for robust and quick immobilization of biomolecules on any type of substrate. However, as of now there are just very few papers dealing with the deposition of epoxy layers by plasma polymerization, probably due to the high reactivity of this group leading to a low functionalization efficiency. In this work we carried out an extensive experimental and theoretical investigation of plasma synthesis of epoxide groups from a low pressure allyl glycydyl ether (AGE) plasma. The influence of composite parameter W/F and the working pressure on the density of epoxide groups and the layer stability was thoroughly addressed. It was found that by increasing the working pressure it is possible to sufficiently raise the concentration of epoxide groups. The composite parameter W/F was shown to be a crucial parameter in affecting the density of epoxides. An optimal value of W/F of around 2.3 eV per molecule leading to the highest density of epoxides produced in the process at 15 Pa was revealed through FT-IR and XPS findings. This value correlates well with the ab initio calculations suggesting that the lowest bond dissociation energy belongs to the C-O bond of the epoxide ring. Therefore, in order to increase the density of epoxides deposited by plasma polymerization, a precursor molecule containing at least two epoxide rings is strongly advised to be employed.
机译:环氧化物基团的通过等离子体聚合的沉积打开用于在任何类型的基板的生物分子的健壮和快速固定新的视野。然而,由于现在有刚刚处理环氧树脂层的通过等离子体聚合沉积,可能是由于该组导致低效率官能的高反应性很少论文。在这项工作中,我们进行了广泛的实验和从低压烯丙基glycydyl醚(AGE)等离子体环氧基团的等离子体合成的理论研究。复合参数W / F的影响,并且对环氧化物基团的密度的工作压力和层稳定性被彻底解决。结果发现,通过增加工作压力,可以充分提高环氧基团的浓度。复合参数W / F被证明是在影响环氧化物的密度的关键参数。的W / F的约2.3的最佳值EV每分子导致在过程中产生的在15帕通过FT-IR显示和XPS发现环氧化物的密度最高。该值与AB良好相关initio计算表明最低键离解能属于环氧化物环的C-O键。因此,为了提高通过等离子体聚合沉积环氧化物的密度,强烈建议含有至少两个环氧环的前体分子,以被采用。

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    Natl Univ Sci &

    Technol MISiS Leninsky Pr 4 Moscow 119049 Russia;

    Masaryk Univ CEITEC Cent European Inst Technol RG Plasma Technol Purkynova 123 Brno 61200 Czech Republic;

    Masaryk Univ CEITEC Cent European Inst Technol RG Plasma Technol Purkynova 123 Brno 61200 Czech Republic;

    Masaryk Univ CEITEC Cent European Inst Technol RG Plasma Technol Purkynova 123 Brno 61200 Czech Republic;

    Luxembourg Inst Sci &

    Technol Mat Res &

    Technol Dept 5 Ave Hauts Fourneaux Esch Sur Alzette Luxembourg;

    Masaryk Univ CEITEC Cent European Inst Technol RG Plasma Technol Purkynova 123 Brno 61200 Czech Republic;

    Siberian Fed Univ 79 Svobodny Av Krasnoyarsk 660041 Russia;

    Natl Univ Sci &

    Technol MISiS Leninsky Pr 4 Moscow 119049 Russia;

    Masaryk Univ CEITEC Cent European Inst Technol RG Plasma Technol Purkynova 123 Brno 61200 Czech Republic;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理学;化学;
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