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Electrically-functionalised nanoindenter dedicated to local capacitive measurements: Experimental set-up and data-processing procedure for quantitative analysis

机译:电官能化纳米茚,专用于局部电容测量:用于定量分析的实验设置和数据处理程序

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摘要

In this work, we report the experimental development and the application of a new characterisation tool combining mechanical testing and dielectric characterisation. The experimental set-up is essentially a nanoindentation head functionalised for capacitive measurements. First the experimental procedure for the characterisation of dielectric thin films is given: detailed set-up description, procedure for the capacitance-vs-voltage (C-V) measurements, stray capacitance. Secondly, a complete data-processing method is proposed to perform the quantitative analysis of capacitance data. To this end, a fully analytical model has been developed, able to relate the C-V curves to the system characteristics (set-up geometry and specimen properties) without any fitting parameter. Finally dielectric films with different thicknesses and relative permittivities have been tested to validate both the characterisation tool and the data-processing method. The analytical model has been used to predict the permittivity of each dielectric thin film. The extracted data have been compared to data obtained from a calibrated macro-scale technique and showed remarkable agreement. One of the strengths of the data-processing method is to eliminate the stray capacitance which usually disturbs local capacitance measurements. Even though the effect of mechanical load is not investigated in the present study, the experimental proof-of-principle is shown and the data-processing method is validated. This work opens prospects for local and quantitative dielectric characterisations under mechanical loads. It should also fill a gap between quantitative characterisations at macro-scales and spatially highly-resolved characterisations at nano-scale. (C) 2019 Elsevier B.V. All rights reserved.
机译:在这项工作中,我们报告了新表征工具的实验开发和应用结合机械测试和介电表征。实验组基本上是用于电容测量的纳米狭窄头。首先给出了介电薄膜表征的实验过程:详细的设置描述,用于电容-VS-电压(C-V)测量的过程,杂散电容。其次,提出了一种完整的数据处理方法来执行电容数据的定量分析。为此,已经开发了完全分析模型,能够将C-V曲线与系统特性(设置几何和样本属性)相关联,而无需任何配合参数。最后测试了具有不同厚度和相对允许性的介电膜以验证表征工具和数据处理方法。分析模型已用于预测每个介电薄膜的介电常数。将提取的数据与从校准的宏观技术获得的数据进行比较,并显示出显着的协议。数据处理方法的一个优点是消除通常扰动局部电容测量的杂散电容。尽管在本研究中未研究机械负荷的效果,但示出了实验原理证明,并验证了数据处理方法。这项工作为机械负载下的局部和定量介电特征开辟了前景。它还应该填充在宏观尺度的定量特征与纳米级的空间高度解析的特征之间的间隙。 (c)2019 Elsevier B.v.保留所有权利。

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