首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Influence of zinc oxide on the physical, structural and optical band gap of zinc silicate glass system from waste rice husk ash
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Influence of zinc oxide on the physical, structural and optical band gap of zinc silicate glass system from waste rice husk ash

机译:氧化锌对废稻壳灰锌硅酸盐玻璃系统物理,结构和光带隙的影响

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Zinc silicate (ZnO-SiO2) glass was fabricated using melt-quench technique with compositions according to the empirical formula [(ZnO),,(WRHA)(1-x)] which x=0.50, 0.55, 0.57 wt.%. These glass series acquire zinc oxide (ZnO) and white rice husk ash (WRHA) as silica source with two different melting temperatures of 1450 degrees C and 1500 degrees C. Temperature of 1450 degrees C and 1500 degrees C were chosen in this study because the lowest melting point of ZnO-SiO2 were at 1475 degrees C and by choosing a temperature within the range of 1475 degrees C a conclusive study on the best melting point using WRHA substituents can be done. Physical, structural and optical characteristics of fabricated glass samples were analyzed using Energy Dispersive X-ray Fluorescence (EDXRF), X-ray diffraction (XRD), Fourier Transform Infrared Spectroscopy (FTIR) and UV-vis (UV-vis). Optical band gap of the system was obtained by approaching the optical absorption techniques from the Mott-Davis methods. Results indicate that ZnO-SiO2 glass samples emerge in favors of direct and indirect forbidden transition and increase in ZnO causes a higher absorption thus resulting in lower band gap. Last but not least, in this study based on the increase of ZnO content, the glass samples which contains a higher amount of ZnO has a higher band gap as Zn2+ ions reacts as good network modifier in the glass structure and formed a better arrangement and structure compared to system which has less network modifier. (C) 2017 Elsevier GmbH. All rights reserved.
机译:使用根据经验式[(ZnO)的组合物的熔融淬火技术制备硅酸盐(ZnO-SiO2)玻璃,X = 0.50,0.55,0.57重量%。%。这些玻璃系列获取氧化锌(ZnO)和白米壳灰(WRHA)作为二氧化硅源,在这项研究中选择了1450℃和1500℃的不同熔化温度和1500摄氏度的温度,因为该研究选择了1450℃和1500℃。 ZnO-SiO 2的最低熔点为1475℃,通过在1475摄氏度的范围内选择温度,可以使用WRHA取代基的最佳熔点的结论性研究。使用能量分散X射线荧光(EDXRF),X射线衍射(XRD),傅里叶变换红外光谱(FTIR)和UV-Vis(UV-Vis)分析制造玻璃样品的物理,结构和光学特性。通过从Mott-Davis方法接近光学吸收技术获得系统的光学带隙。结果表明,ZnO-SiO2玻璃样品出现在直接和间接禁止过渡的促进和间接禁止的转变中,ZnO的增加导致较高的吸收,从而导致较低的带隙。最后但并非最不重要的是,在该研究基于ZnO含量的增加,含有较高量ZnO的玻璃样品具有更高的带隙,因为Zn2 +离子在玻璃结构中作为良好的网络改性剂反应并形成更好的布置和结构与具有较少网络修饰符较少的系统相比。 (c)2017年Elsevier GmbH。版权所有。

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