EUV multilayer mirrors in solar X-EUV Imager

摘要

Fe XII line (19.5 nm) is one of important targets of imaging detection in solar spectrum, and 19.5 nm multilayer mirrors were employed to reflect 19.5 nm line and suppress sidelobe. 19.5 nm multilayer mirrors with a bandwidth of 1.0 nm are in demand in Solar X-EUV imager installed in FengYun III satellite. Thickness ratios of Mo layer of 0.15 and 0.11, respectively, are utilized in multilayer mirrors at normal and 45 degrees incidence. The influence of roughness/diffusion on reflectance is discussed, and profile changes of substrate after deposition are also analyzed.