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首页> 外文期刊>Optics Letters >Fabrication of antireflection microstructures on the surface of GaSe crystal by single-pulse femtosecond laser ablation
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Fabrication of antireflection microstructures on the surface of GaSe crystal by single-pulse femtosecond laser ablation

机译:单脉冲飞秒激光烧蚀通过单脉冲晶体表面上的抗反射微结构的制造

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摘要

GaSe crystals are promising as nonlinear optical converters in the mid- and far-IR ranges. However, it is challenging to increase the GaSe surface transmittance of 77% with conventional antireflection coatings because of poor surface quality, leading to coating adhesion problems. Antireflection microstructures (ARMs) offer an alternative way of increasing surface transmittance. In this work, ARMs were fabricated on the surface of a GaSe plate by single-pulse femtosecond laser ablation. An average GaSe surface transmittance of 94% in the 7-11 mu m range and a maximum transmittance of 97.8% at 8.5 mu m were obtained. The proposed method can be used to increase the efficiency of GaSe-based nonlinear converters. (C) 2020 Optical Society of America
机译:Gase Crystals在中频和IR范围内具有非线性光学转换器。 然而,由于表面质量差,通过常规抗反射涂层增加77%的Gase表面透射率挑战,导致涂层粘附问题。 抗反射组织(臂)提供了增加表面透射率的替代方法。 在这项工作中,通过单脉冲飞秒激光烧蚀在Gase板的表面上制造武器。 在7-11μm范围内的平均Gase表面透射率为94%,获得8.5μm的最大透射率为97.8%。 所提出的方法可用于提高基于GQUES的非线性转换器的效率。 (c)2020美国光学学会

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