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首页> 外文期刊>RSC Advances >Anisotropic ultrahigh hole mobility in two-dimensional penta-SiC2 by strain-engineering: electronic structure and chemical bonding analysis
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Anisotropic ultrahigh hole mobility in two-dimensional penta-SiC2 by strain-engineering: electronic structure and chemical bonding analysis

机译:应变工程二维PENTA-SIC2中的各向异性超高孔流动性:电子结构和化学键合分析

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摘要

Monolayer pentagonal silicon dicarbide is a 2D material composed entirely of pentagons, and it possesses novel electronic properties possibly leading to many potential applications. In this paper, using first-principles calculations, we have systematically investigated the electronic, mechanical and transport properties of monolayer penta-SiC2 by strain-engineering. By applying in-plane tensile or compressive strain, it is possible to modulate the physical properties of monolayer penta-SiC2, which subsequently changes the transport behaviour of the carriers. More interestingly, at room temperature, the uniaxial compressive strain of -8% along the a-direction can enhance the hole mobility of monolayer penta-SiC2 along the b-direction by almost three orders of magnitude up to 1.14 x 10(6) cm(2) V-1 s(-1), which is much larger than that of graphene, while similar strains have little influence on the electron mobility. The ultrahigh and strain-modulated carrier mobility in monolayer penta-SiC2 may lead to many novel applications in high-performance electronic and optoelectronic devices.
机译:单层五角形硅片二碳是一种完全由Pentagons组成的2D材料,它具有可能导致许多潜在应用的新颖电子性能。本文采用了第一原理计算,通过应变工程系统地研究了单层Penta-SiC2的电子,机械和运输性能。通过施加面内拉伸或压缩菌株,可以调节单层PENTA-SIC2的物理性质,其随后改变载体的传输行为。更有趣的是,在室温下,沿着A方向的单轴压缩菌株-8%可以沿着B方向增强单层Penta-SiC2的空穴迁移率几乎是1.14×10(6)厘米的几乎三个数量级(2)V-1 S(-1)比石墨烯大得多,而相似的菌株对电子迁移率几乎没有影响。单层Penta-SiC2中的超高和应变调制的载体迁移率可能导致高性能电子和光电器件中的许多新颖的应用。

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  • 来源
    《RSC Advances 》 |2017年第72期| 共9页
  • 作者单位

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Ningbo 315201 Zhejiang Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

    Nanjing Univ Natl Lab Solid State Microstruct Nanjing 210093 Jiangsu Peoples R China;

    Fudan Univ Key Lab Micro &

    Nano Photon Struct Minist Educ Dept Opt Sci &

    Engn Shanghai 200433 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学 ;
  • 关键词

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