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Effect of polymer residues on the electrical properties of large-area graphene-hexagonal boron nitride planar heterostructures

机译:聚合物残基对大面积石墨烯 - 六边形氮化物平面杂交性能的影响

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摘要

Polymer residue plays an important role in the performance of 2D heterostructured materials. Herein, we study the effect of polymer residual impurities on the electrical properties of graphene-boron nitride planar heterostructures. Large-area graphene (Gr) and hexagonal boron nitride (h-BN) monolayers were synthesized using chemical vapor deposition techniques. Atomic van-der-Waals heterostructure layers based on varied configurations of Gr and h-BN layers were assembled. The average interlayer resistance of the heterojunctions over a 1 cm(2) area for several planar heterostructure configurations was assessed by impedance spectroscopy and modeled by equivalent electrical circuits. Conductive AFM measurements showed that the presence of polymer residues on the surface of the Gr and h-BN monolayers resulted in significant resistance deviations over nanoscale regions.
机译:聚合物残留物在2D异质结构材料的性能中起着重要作用。 在此,我们研究了聚合物残留杂质对石墨烯 - 氮化硼平面异质结构的电学性质的影响。 使用化学气相沉积技术合成大区域石墨烯(GR)和六边形氮化硼(H-BN)单层。 组装了基于GR和H-BN层的变化构型的原子van-Der-WaaS的异质结构层。 通过阻抗光谱评估若干平面异质结构构造的1cm(2)区域的异质结的平均层间电阻,并通过等效电路建模。 导电AFM测量表明,GR和H-BN单层表面上的聚合物残留物导致纳米级区域的显着抗性偏差。

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