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首页> 外文期刊>Nanotechnology >Pressure and electric field tuning of Schottky contacts in PdSe2/ZT-MoSe2 van der Waals heterostructure
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Pressure and electric field tuning of Schottky contacts in PdSe2/ZT-MoSe2 van der Waals heterostructure

机译:Pdse2 / ZT-MOSE2 VAN DER WALASS的肖特基触点的压力和电场调谐

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A two-dimensional van der Waals (vdW) heterostructure (PdSe2/ZT-MoSe2) has been investigated through vdW corrected density functional theory. ZT-MoSe2 acts as a Dirac material with an anisotropic Dirac cone and variable Fermi velocity (0.52-1.91 x 10(5) ms(-1)). The intrinsic Schottky barrier height can be effectively tuned by applying external pressure and an electric field to the heterostructure. The p-type Schottky barrier transforms into a p-type ohmic contact at pressure P 16 GPa. A positive electric field induces p-type ohmic contact while a negative electric field results in the transition from p-type Schottky contact to n-type Schottky contact, and finally to n-type ohmic contact at the higher values of the field. Moreover, the external positive (negative) electric field induces n-type (p-type) doping of ZT-MoSe2 in the heterostructure and remarkably controls the charge carrier concentration. Our results demonstrate that controlling the external pressure and electric field in a PdSe2/ZT-MoSe2 heterostructure can result in an unprecedented opportunity for the design of high-performance nanodevices.
机译:通过VDW校正密度函数理论研究了二维范德华(VDW)异质结构(PDSE2 / ZT-MOSE2)。 ZT-MOSE2用作具有​​各向异性DIRAC锥体的DIRAC材料和可变的FERMI速度(0.52-1.91×10(5)MS(-1))。通过将外部压力和电场施加到异质结构,可以有效地调谐内在肖特基势垒高度。 P型肖特基屏障在压力P16GPa处变成P型欧姆接触。正电场诱导p型欧姆接触,而负电场导致从P型肖特基接触到N型肖特基触点的过渡,最后在该域的较高值下终于n型欧姆接触。此外,外部正(负)电场在异质结构中引起ZT-MOSE2的n型(p型)掺杂,并且显着控制电荷载流子浓度。我们的结果表明,控制PDSE2 / ZT-MOSE2异质结构中的外部压力和电场可能导致高性能纳米型设计的前所未有的机会。

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