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首页> 外文期刊>Electrochimica Acta >Electrodeposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing benzyl alcohol
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Electrodeposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing benzyl alcohol

机译:来自含苄醇的甲磺酸电解质Cu-Sn合金的电沉积

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Highlights?Cu-Sn alloys were readily deposited from a MSA-based electrolyte?The proposed formulation allows deposition of coatings with up to 62.4 wt.% of Sn?Addition of benzyl alcohol increases Sn content in the deposit at low Cu2+/Sn2+?Benzyl alcohol also acts as a levelling agent avoiding rough or dendritic deposits?Different phases can be deposited using this bath changing the deposition potentialAbstractDeposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing small amounts of benzyl alcohol was investigated. Polarisation experiments (cylic and linear sweep voltammetry) were carried out using a rotating disc electrode to identify the reduction and dissolution processes that take place in the system and to determine the effect of the solution constituents on them. Potentiostatic deposition was performed onto a rotating cylinder electrode and the resulting deposits were charactised using SEM and XRD. The results showed that co-deposition of copper and tin is possible even at potentials less cathodic than tin discharge potential. The latter was attributed to the underpotential deposition of Sn2+on a copper substrate. Smooth and compact deposits were obtained at various deposition potentials and Cu2+concentrations, with Sn contents between 1.6 - 62.4 wt.%. Several stable phases, such as pure copper,α-CuSn,?-Cu3Sn andη′-Cu6Sn5phase, were detected at different operating conditions. Finally, it was found that BA increases the amount of tin in the deposit when Cu2+concentrations in the solution is kept low, especially at high overpotentials. This additive also inhibits the formation of dendrites and reduces surface roughness.]]>
机译:<![cdata [ 突出显示 Cu-sn合金从MSA基电解质容易地沉积来自MSA的电解质 所提出的配方允许涂层沉积高达62.4重量。百分比Sn 添加苄醇的加入在低Cu 2 + / sn 2 + 苄醇还用作避免粗糙或树突式沉积的平整剂 可以使用此浴槽沉积不同的阶段,更改沉积电位 摘要 Cu-sn合金的沉积研究了含有少量苄醇的甲磺酸电解质。使用旋转盘电极进行偏振实验(圆柱和线性扫描伏安法)以识别系统中发生的还原和溶解过程,并确定溶液成分对它们的影响。在旋转圆筒电极上进行电位沉积,并使用SEM和XRD表示所得沉积物。结果表明,甚至可能比锡放电电位较少的阴极潜在的铜和锡的共沉积。后者归因于SN 2 + 在铜基板上的潜在沉积。在各种沉积电位和Cu α -cusn, -cu 3 < / ce:inf> sn和η' - cu 6 sn 在不同的操作条件下检测5 阶段。最后,发现当Cu 2 + 浓度保持低电平时,Ba增加沉积物中的锡量,特别是在高过电位。该添加剂还抑制树突的形成并减少表面粗糙度。 ]]>

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