Contribution of Edge Structure Towards Enhanced Thermal Stability of Graphene-Based Materials

摘要

An advanced approach for direct covalent functionalization (DCF) of graphene-based material has been developed. The functionalized graphene oxide (f-GO) has been prepared with the robust sonochemical approach with complete deletion of hazardous acylating and coupling reagents. The as-prepared f-GO was extensively characterized with various analytical techniques like near edge X-ray absorption fine structure (NEXAFS),~(13)C SSNMR, HRXPS, HRTEM, XRD, Raman, AFM, TGA, DSC and FTTR. An investigation of thermal applications of graphene-based materials has been confined due to the conventional thermal instability of graphene oxide (GO). However. DCF through contribution of C_K edges of graphene oxide, have confirmed the significance of f-GO towards enhanced thermal stability. The total percentage weight loss in TG-DTA has confirmed an enhanced thermal stability of f-GO. The contribution of edge structure towards enhanced thermal stability has confirmed with near edge XAFS spectroscopy. The participation of various atomic domains has synergistically contributed towards enhanced thermal stability of f-GO.