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The LVV Auger line shape of sulfur on copper studied by Auger photoelectron coincidence spectroscopy

机译:俄歇光电子符合光谱研究铜上硫的LVV俄歇线形

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We have studied the line shapes of Cu(0 0 1)-p(2 x 2) S L-2 VV and L-3 VV Auger decay by means of Auger photoelectron coincidence spectroscopy. Measuring the LVV Auger spectrum in coincidence with S 2p(1/2) and 2p(3/2) photoelectrons respectively, we have been able to separate the two overlapping Auger spectra and determine their intrinsic line shapes. The two Auger transitions, though shifted in energy, display an identical line shape whose main features can be qualitatively understood considering a single particle approximation but are better described within a Cini-Sawatzky (CS) approach. Comparison between the experimental and the CS calculated spectra confirms that a substantial part of the Auger lines (similar to 20%) can be ascribed to decay events accompanied by the excitation of one additional electron-hole pair in the valence band. For the first time, the locality of the Auger process combined with the surface sensitivity of the APECS technique and its ability to separate overlapping structures are used to study Auger transitions taking place at the the surface states of a Soble-metal interface.
机译:我们已经通过俄歇光电子重合谱研究了Cu(0 0 1)-p(2 x 2)S L-2 VV和L-3 VV的俄歇衰变线形。分别与S 2p(1/2)和2p(3/2)光电子同时测量LVV Auger光谱,我们已经能够分离出两个重叠的Auger光谱并确定其固有线形。尽管能量发生了偏移,但两个俄歇跃迁却显示出相同的线形,考虑到单个粒子的近似,可以定性地理解其主要特征,但在Cini-Sawatzky(CS)方法中可以更好地描述它们。实验光谱和CS计算光谱之间的比较证实,俄歇线的绝大部分(约20%)可以归因于衰变事件,伴随着价带中一个额外的电子-空穴对的激发。俄歇过程的局部性与APECS技术的表面敏感性及其分离重叠结构的能力首次用于研究在S /贵金属界面的表面态发生的俄歇跃迁。

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