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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Influence of applied tensile stress on the hysteresis curve and magnetic domain structure of grain-oriented Fe–3%Si steel
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Influence of applied tensile stress on the hysteresis curve and magnetic domain structure of grain-oriented Fe–3%Si steel

机译:施加拉伸应力对取向Fe-3%Si钢磁滞曲线和磁畴结构的影响

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The influence of applied tensile stress on the hysteresis curve and domain structure in conventional (1 1 0)[0 0 1] Fe–3%Si steel, cut parallel to the rolling direction, is studied on samples with different grain sizes. Quasistatic hysteresis loops under tensile stresses up to 70MPa were measured. The magnetic domains and magnetization processes were observed by longitudinal Kerr microscopy at different levels of stress. It is shown that for stresses exceeding 5–10MPa the bulk hysteresis loop can be described with good accuracy by the action of an effective field, which is the product of a function of stress and a function of magnetization. The function of stress is approximately linear with a slope of one. Except for the sample with the smallest grains, the function of magnetization is linear in the magnetization range ±1.2–1.5 T, i.e. it has a typical demagnetizing field shape. Domain observation reveals that the effective field is caused by the demagnetizing fields occurring at grain boundaries and at the sheet surface due to the removal of closure domains transverse to the rolling direction by the tensile stress. The closure structure reappears at higher fields. Another indirect indication of demagnetizing fields is the fact that the hysteresis losses drop continuously with stress and changes in the coercive force are small. The effective field of the sample with the smallest grains increases most nonlinearly with stress similar to the behaviour obtained for non-oriented material.
机译:在不同晶粒度的样品上,研究了在平行于轧制方向切割的常规(1 1 0)[0 0 1] Fe-3%Si钢中施加的拉伸应力对磁滞曲线和畴结构的影响。测量了在高达70MPa的拉伸应力下的准静态磁滞回线。通过纵向克尔显微镜在不同应力水平下观察到磁畴和磁化过程。结果表明,对于超过5-10MPa的应力,通过有效场的作用可以很好地描述整体磁滞回线,该有效场是应力与磁化强度的乘积。应力函数近似线性,斜率为1。除了晶粒最小的样品外,在±1.2–1.5 T的磁化范围内,磁化作用呈线性,即具有典型的退磁场形状。磁畴观察表明,有效磁场是由于拉应力去除了横向于轧制方向的闭合磁畴而在晶界和薄板表面上产生的消磁场所引起的。封闭结构再次出现在较高的区域。消磁磁场的另一个间接指示是,磁滞损耗随着应力而连续下降,并且矫顽力的变化很小。晶粒最小的样品的有效场在最大应力下非线性增加,类似于无取向材料的行为。

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