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Dual length-scale nanotip arrays with controllable morphological features for highly sensitive SERS applications

机译:具有高度可控形态学特征的双长度尺度纳米尖端阵列,用于高度敏感的SERS应用

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摘要

Hexagonally ordered, dual length-scale nanotip arrays were fabricated using a combination of prism holographic lithography, reactive ion etching, and electron-beam evaporation. Double layered, face-centered cubic structures were prepared using prism holographic lithography and were used as templates for the nanotip arrays. The morphological features of the nanotip arrays were easily controlled in the subsequent etching process by varying the etching time and etchant gases. The surfaces of the nanotips were covered with, and roughened by, small protrusions. The nanotip arrays showed tunable surface-enhanced Raman scattering activities that depended on the sharpness, shape, and surface roughness. The simple tunability and high sensitivity of these nanotip arrays make them very promising as a high-fidelity sensing platform.
机译:使用棱镜全息光刻,反应离子刻蚀和电子束蒸发的组合制造了六边形,双长度尺度的纳米尖端阵列。使用棱镜全息光刻技术制备了双层,面心立方结构,并将其用作纳米尖端阵列的模板。通过改变蚀刻时间和蚀刻气体,可以在随后的蚀刻过程中轻松控制纳米尖端阵列的形态特征。纳米尖端的表面被小突起覆盖并被其粗糙化。纳米尖端阵列显示出可调节的表面增强拉曼散射活性,这取决于清晰度,形状和表面粗糙度。这些纳米尖端阵列的简单可调性和高灵敏度使其非常有希望成为高保真感测平台。

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