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首页> 外文期刊>Journal of nanoscience and nanotechnology >Thickness Dependence of Properties of ITO Films Deposited on PET Substrates
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Thickness Dependence of Properties of ITO Films Deposited on PET Substrates

机译:PET基底上沉积的ITO膜的厚度对厚度的依赖性

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摘要

Indium tin oxide (ITO) films with various thicknesses from 104 nm to 513 nm were prepared onto polyethylene terephthalate (PET) substrates by using r.f. magnetron sputtering without intentionally heating the substrates. The structural, optical, and electrical properties of ITO films were investigated as a function of film thickness. It was found that the amorphous nature of the ITO film was dominant below the thickness of about 200 nm but the degree of the crystallinity increased with an increasing thickness above the thickness of about 250 nm, resulting in the increase of carrier concentration and therefore reducing the electrical resistivity from 5.1x10(-3) to 9.4x10(-4) Omega . cm. The average transmittance (400-800 nm) of the ITO deposited PET substrates decreased as the film thickness was increasing and was above 80% for the thickness below 315 nm. The results show that the improvement of the film crystallinity with the film thickness contributes to the increase of the carrier concentration and the enhancement of the electrical conductivity.
机译:通过使用r.f.法将具有104nm至513nm的各种厚度的氧化铟锡(ITO)膜制备到聚对苯二甲酸乙二醇酯(PET)基底上。磁控溅射,无需有意加热基板。研究了ITO膜的结构,光学和电学性质与膜厚度的关系。已经发现,ITO膜的非晶性质在约200nm的厚度以下占主导,但是结晶度随着厚度的增加而增加,在约250nm以上的厚度,导致载流子浓度的增加,因此降低了电阻率从5.1x10(-3)到9.4x10(-4)Omega。厘米。 ITO沉积的PET基板的平均透射率(400-800 nm)随着膜厚度的增加而降低,对于315 nm以下的厚度,其平均透射率超过80%。结果表明,随着膜厚度的增加,结晶度的提高有助于载流子浓度的增加和导电性的提高。

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