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首页> 外文期刊>Journal of Materials Science >Development of a new Schiff-base semiconducting material for thin film active device and analysis of its charge transport mechanism
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Development of a new Schiff-base semiconducting material for thin film active device and analysis of its charge transport mechanism

机译:用于薄膜有源器件的新型席夫基半导体材料的开发及其电荷传输机理分析

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摘要

Schiff-base compounds have rarely been employed in optoelectronics. Herein, we report the optical and electrical properties of a Schiff-base compound, 1,4-bis-(quinolin-6-yl iminomethyl) benzene (BQB), in detail. The electrical properties of BQB have been studied with a thin film made of it. The results of electrical conductivity and measurement of optical band gap of BQB encouraged us to examine its potential application in metal (Al)-semiconductor Schottky diode. I-V measurement of ITO/BQB/Al configuration illustrated its Schottky behavior with a moderate rectification ratio at applied bias potential of +/- 1.0 V. The characteristic diode parameters were obtained. The device showed a good ideality factor of 1.2 and low barrier height of 0.44 eV. Charge transport properties through the metal semiconductor junction, which is critical for device performance, were analyzed by space charge-limited current theory. In this regard, mobility-lifetime product, carrier density, density of states at Fermi level and diffusion length was estimated. The results show that this new Schiff-base compound has the potential for successful application in thin film semiconductor device.
机译:希夫基化合物很少用于光电中。在此,我们详细报告了席夫碱化合物1,4-双-(喹啉-6-基亚氨基甲基)苯(BQB)的光学和电学性质。已经用它制成的薄膜研究了BQB的电性能。 BQB的电导率和光学带隙的测量结果鼓励我们研究其在金属(Al)-半导体肖特基二极管中的潜在应用。 ITO / BQB / Al的I-V测量显示了其肖特基行为,在+/- 1.0 V的施加偏置电势下具有适度的整流比。获得了二极管的特性参数。该器件显示出1.2的良好理想因子和0.44 eV的低势垒高度。通过空间电荷限制电流理论分析了通过金属半导体结的电荷传输特性,这对器件性能至关重要。在这方面,估计了迁移率-寿命乘积,载流子密度,费米能级的状态密度和扩散长度。结果表明,这种新的席夫碱化合物具有成功应用于薄膜半导体器件的潜力。

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