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Theoretical study on strain-induced variations in electronic properties of monolayer MoS_2

机译:应变诱导单层MoS_2电子性质变化的理论研究

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Ultrathin MoS_2 sheets and nanostructures are promising materials for electronic and optoelectronic devices as well as chemical catalysts. To expand their potential in applications, a fundamental understanding is needed of the electronic structure and carrier mobility as a function of strain. In this paper, the effect of strain on electronic properties of monolayer MoS_2 is investigated using ab initio simulations based on density functional theory. Our calculations are performed in both infinitely large two-dimensional (2D) sheets and one-dimensional (1D) nanoribbons which are theoretically cut from the sheets with semiconducting [1100] (armchair) edges. The 2D crystal is studied under biaxial strain, uniaxial strain, and uniaxial stress conditions, while the 1D nanoribbon is studied under a uniaxial stress condition. Our results suggest that the electronic bandgap of the 2D sheet experiences a direct-indirect transition under both tensile and compressive strains. Its bandgap energy (E_g) decreases under tensile strain/stress conditions, while for an in-plane compression, E_g is initially raised by a small amount and then decreased as the strain varies from 0 to -6 %. On the other hand, E_g at the semiconducting edges of monolayer MoS_2 nanoribbons is relatively invariant under uniaxial stretches or compressions. The effective masses of electrons at the conduction band minimum (CBM) and holes at the valence band maximum (VBM) are generally decreased as the in-plane extensions or compressions become stronger, but abrupt changes occur when CBM or VBM shifts between different k-points in the first Brillouin zone.
机译:超薄MoS_2薄片和纳米结构是用于电子和光电设备以及化学催化剂的有前途的材料。为了扩大其在应用中的潜力,需要对作为应变函数的电子结构和载流子迁移率有基本的了解。本文使用基于密度泛函理论的从头算来研究应变对单层MoS_2电子性能的影响。我们的计算是在无限大的二维(2D)薄片和一维(1D)纳米带上进行的,这些纳米带理论上是从具有半导体[1100](扶手椅)边缘的薄片上切下来的。在双轴应变,单轴应变和单轴应力条件下研究2D晶体,而在单轴应力条件下研究1D纳米带。我们的结果表明,二维片材的电子带隙在拉伸和压缩应变下都经历了直接-间接转变。它的带隙能量(E_g)在拉伸应变/应力条件下降低,而对于平面压缩,E_g首先升高少量,然后随着应变从0到-6%变化而降低。另一方面,单层MoS_2纳米带的半导体边缘处的E_g在单轴拉伸或压缩下相对不变。随着平面内延伸或压缩变得更强,导带最小值(CBM)的电子有效质量和价带最大值(VBM)的空穴有效质量通常会降低,但是当CBM或VBM在不同的k-值之间移动时,会发生突变。点在第一个布里渊区中。

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