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首页> 外文期刊>Journal of Materials Science >Dense PLZT films grown on nickel substrates by PVP-modified sol-gel method
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Dense PLZT films grown on nickel substrates by PVP-modified sol-gel method

机译:通过PVP改性溶胶-凝胶法在镍基底上生长的致密PLZT膜

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摘要

We have successfully grown ferroelectric Pb_(0.92)La _(0.08)Zr_(0.52)Ti_(0.48)O_3 (PLZT) films on base metal foils by chemical solution deposition using sol-gel solutions containing polyvinylpyrrolidone. Under zero-bias field, we measured a dielectric constant of ≈820 and dielectric loss of ≈0.06 at room temperature, and a dielectric constant of ≈1250 and dielectric loss of ≈0.03 at 150 °C. In addition, leakage current density of ≈1.5 × 10~(-8) A/cm~2, remanent polarization of ≈11.2 μC/cm~2, and coercive field of ≈40.6 kV/cm were measured at room temperature on a ≈3-μm-thick PLZT film grown on LaNiO_3-buffered nickel substrate. Finally, energy density ≈25 J/cm~3 was measured from the P-E hysteresis loop at an applied field of 2 × 10~6 V/cm.
机译:我们已经通过使用包含聚乙烯吡咯烷酮的溶胶-凝胶溶液通过化学溶液沉积法成功地在基础金属箔上生长了铁电Pb_(0.92)La _(0.08)Zr_(0.52)Ti_(0.48)O_3(PLZT)膜。在零偏场下,我们在室温下测得的介电常数约为820,介电损耗约为0.06,在150°C下测得的介电常数约为1250,介电损耗约为0.03。此外,在室温下,在室温下测得的漏电流密度为≈1.5×10〜(-8)A / cm〜2,剩余极化强度为≈11.2μC/ cm〜2,矫顽场为≈40.6kV / cm。在LaNiO_3缓冲的镍基板上生长3μm厚的PLZT膜。最后,在2×10〜6 V / cm的施加电场下,从P-E磁滞回线测得的能量密度≈25J / cm〜3。

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