首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Heating rate tuning in structure, morphology and electricity properties of Cu2FeSnS4 thin films prepared by sulfurization of metallic precursors
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Heating rate tuning in structure, morphology and electricity properties of Cu2FeSnS4 thin films prepared by sulfurization of metallic precursors

机译:金属前驱物硫化制得的Cu2FeSnS4薄膜的结构,形貌和电性能的升温速率调节

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摘要

Cu2FeSnS4 (CFTS) thin films have been synthesized by sulfurization of the sputtered metallic layers. The disappeared coexistence phase (Cu2FeSn3S8) and reduced strain have been observed in CFTS thin films accompanying the ritardando heating rate of sulfurization, and no impurity phase is detected in the samples. It is found that the S content at the bottom of CFTS thin films turns out to be very sensitive to the heating rate. The CFTS thin film sulfurized under faster heating rate has S-poor state with a bilayer structure and lots of micro-grains occupy the bottom of the CFTS thin film, while it has been obviously improved by reducing the heating rate. The optical transmission spectrum reveals that valence band maximum and conduction band minimum of CFTS are away from one another gradually with the decreasing heating rate, corresponding to the enhanced band gap energy of CFTS from 1.42 to 1.47 eV. As for these four CFTS devices, the highest open circuit voltage is 129 mV with short circuit current of 3.25 mA/cm(2), which increased by 17.3% and 30.0%, respectively, compared to the previous work. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过溅射金属层的硫化合成了Cu2FeSnS4(CFTS)薄膜。伴随着硫的ritardando加热速率,在CFTS薄膜中观察到消失的共存相(Cu2FeSn3S8)和应变降低,并且在样品中未检测到杂质相。结果发现,CFTS薄膜底部的S含量对加热速率非常敏感。在较快的加热速率下硫化的CFTS薄膜呈S贫乏状态,具有双层结构,大量微晶粒占据CFTS薄膜的底部,而通过降低加热速率可以明显改善。光学透射光谱表明,CFTS的价带最大值和导带最小值随着加热速率的降低而逐渐彼此远离,这与CFTS的带隙能量从1.42 eV增大到1.47 eV相对应。对于这四个CFTS器件,最高开路电压为129 mV,短路电流为3.25 mA / cm(2),与以前的工作相比,分别增加了17.3%和30.0%。 (C)2016 Elsevier B.V.保留所有权利。

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