首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Electrical transport, microstructure and optical properties of Cr-doped In_2O_3 thin film prepared by sol-gel method
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Electrical transport, microstructure and optical properties of Cr-doped In_2O_3 thin film prepared by sol-gel method

机译:溶胶-凝胶法制备Cr掺杂In_2O_3薄膜的电输运,微观结构和光学性质

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摘要

High transparent In_2O_3 and Cr-doped In_2O_3 (In_(2-x)Cr_xO_3) nanocrystalline thin films were prepared using a simple sol-gel method followed by a spin coating technique. The effect of Cr concentration on the structural, microstructure, electrical and optical properties of In_(2-x)Cr_xO_3 were systematically investigated using X-ray diffractometer (XRD), atomic force microscopy (AFM), UV-vis spectroscopy, field emission scanning electron microscopy (FESEM) and Hall effect technique. The films have good crystallization with preferred orientation to (222) direction. The lattice parameters, o, of In_2O_3 system increased at lowest dopants (x ? 0.025) and decreased as the dopant was further increased. The optical transmittance of films increased up to 98% for x = 0.05 and decreased for further Cr concentrations. From AFM measurement the films nanocrystals morphology was depending on Cr concentrations. The band gap was around 3.76 eV for pure and with x ≤ 0.075 however it increased. The effect of Cr concentrations on conducting mechanisms of In_2O_3 film has been investigated from 80 to 300 K using thermal activated conduction band and hopping models. The films, at x = 0.0-0.075, have typical semiconductor behaviour. Three different conducting mechanisms have been estimated. All thermal activation energies and conduction hopping parameters have been determined and analysed in details.
机译:使用简单的溶胶-凝胶法和旋涂技术制备高透明的In_2O_3和Cr掺杂的In_2O_3(In_(2-x)Cr_xO_3)纳米晶体薄膜。利用X射线衍射仪(XRD),原子力显微镜(AFM),紫外可见光谱,场发射扫描系统研究了Cr浓度对In_(2-x)Cr_xO_3的结构,微观结构,电学和光学性质的影响。电子显微镜(FESEM)和霍尔效应技术。所述膜具有良好的结晶性,并优选具有朝向(222)方向的取向。 In_2O_3系统的晶格参数o在最低掺杂剂(x≤0.025)处增加,并随着掺杂剂的进一步增加而降低。当x = 0.05时,薄膜的透光率提高至98%,而对于其他Cr浓度,其透光率则下降。通过AFM测量,膜纳米晶体的形态取决于Cr的浓度。纯净带隙约为3.76 eV,x≤0.075时,带隙增加。利用热活化导带和跳跃模型研究了Cr浓度对In_2O_3薄膜导电机理的影响。 x = 0.0-0.075的薄膜具有典型的半导体性能。估计了三种不同的传导机制。已经确定并详细分析了所有热活化能和传导跳跃参数。

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