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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >A short literature survey on iron and cobalt ion doped TiO_2 thin films and photocatalytic activity of these films against fungi
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A short literature survey on iron and cobalt ion doped TiO_2 thin films and photocatalytic activity of these films against fungi

机译:铁钴离子掺杂的TiO_2薄膜及其对真菌的光催化活性的文献综述

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摘要

In this study, a short recent literature survey which concentrated on the usage of Fe~(3+) or Co~(2+) ion doped TiO_2 thin films and suspensions were summarized. Additionally, a sol-gel method was used for preparation of the 2% Co or Fe doped TiO_2 thin films. The surface of the prepared materials was characterised using scanning-electron microscopy (SEM) combined with energy dispersive X-ray (EDX) analysis and band gap of the films were calculated from the transmission measurements that were taken over the range of 190 and 1100 nm. The E_g value was 3.40 eV for the pure TiO_2, 3.00 eV for the Fe-doped TiO_2 film and 3.25 eV for Co-TiO_2 thin film. Iron or cobalt doping at lower concentration produce more uniformed particles and doping greatly affected the size and shape of the TiO_2 nanoparticles. Photocatalytic killing effect of the 2% Co doped TiO_2 thin film on Candida albicans was significantly higher than Fe doped TiO_2 thin film for short and long exposure periods. Doped thin films were more effective on Aspergillus niger for short exposure periods.
机译:在这项研究中,总结了近期的简短文献综述,集中于使用Fe〜(3+)或Co〜(2+)离子掺杂的TiO_2薄膜和悬浮液。另外,采用溶胶-凝胶法制备了2%Co或Fe掺杂的TiO_2薄膜。使用扫描电子显微镜(SEM)结合能量色散X射线(EDX)分析对所制备材料的表面进行表征,并根据在190和1100 nm范围内的透射率测量值来计算薄膜的带隙。纯TiO_2的E_g值为3.40 eV,掺铁的TiO_2薄膜的E_g值为3.00 eV,Co-TiO_2薄膜的E_g值为3.25 eV。较低浓度的铁或钴掺杂会产生更均匀的颗粒,并且掺杂极大地影响了TiO_2纳米颗粒的尺寸和形状。 2%Co掺杂的TiO_2薄膜对白色念珠菌的光催化杀伤作用在短时间和长时间曝光下均显着高于Fe掺杂的TiO_2薄膜。掺杂的薄膜在短时间内暴露于黑曲霉上更有效。

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