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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Effects of annealing temperature on structure and opt-electric properties of ion-conducting LLTO thin films prepared by RF magnetron sputtering
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Effects of annealing temperature on structure and opt-electric properties of ion-conducting LLTO thin films prepared by RF magnetron sputtering

机译:退火温度对射频磁控溅射制备离子导电LLTO薄膜的结构和光电性能的影响

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摘要

Highly transparent and ion-conducting lithium lanthanum titanate (LLTO) thin films were deposited on ITO/glass substrates by RF magnetron sputtering. The results of X-ray diffraction indicate that the as-prepared LLTO thin films and the annealed ones at temperatures up to 300 °C are amorphous; however, crystal phases, including La_(0.56)Li_(0.33)TiO_3 and other unexpected ones, appear on the annealed films at 400 °C. SEM and AFM results show that the prepared films turn to be denser, smoother and more uniform up to 300 °C while the deteriorative results come out following the further enhancement of annealing temperature.
机译:通过RF磁控溅射在ITO /玻璃基板上沉积高度透明且导电离子的钛酸锂镧(LLTO)薄膜。 X射线衍射结果表明,所制备的LLTO薄膜和在300°C以下的退火薄膜均为非晶态。然而,在400℃下,退火膜上会出现La_(0.56)Li_(0.33)TiO_3等晶相。扫描电镜和原子力显微镜结果表明,所制得的薄膜在300°C时变得更致密,更光滑,更均匀,而随着退火温度的进一步提高,薄膜的性能变差。

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