首页> 外文期刊>Journal of Applied Polymer Science >Synthesis and Characterization of Poly(dimethylsiloxane-urethane) Nanocomposites: Effect of (In)Completely Condensed Silsesquioxanes on Thermal, Morphological, and Mechanical Properties
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Synthesis and Characterization of Poly(dimethylsiloxane-urethane) Nanocomposites: Effect of (In)Completely Condensed Silsesquioxanes on Thermal, Morphological, and Mechanical Properties

机译:聚(二甲基硅氧烷-氨基甲酸酯)纳米复合材料的合成和表征:(In)完全缩合的倍半硅氧烷对热,形态和机械性能的影响

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摘要

The structural properties of completely condensed and incompletely condensed silsesquioxane in the polyurethane nanocomposites containing 17.5 wt % of silsesquioxane was investigated by FTIR, TGA, scanning electron microscopy (SEM), X-ray diffraction (XRD), and DMA techniques. FTIR spectra shows the existence of hydrogen bonding in the PU-POSS system. The intensity of hydrogen bonding decreases with the increase in POSS-H loading suggesting the prevention of the formation of hydrogen bonding by the addition of POSS-H molecule. SEM analysis reveals the incompatibility of POSS-H molecule in the PU matrices exhibiting greater extent of phase separation and a large number of POSS aggregates on the addition of POSS-H molecule in the PU-POSS matrices. The TGA thermograms show that the POSS-PU hybrids possess excellent thermal stabilities. However, the incorporation of POSS-H molecule leads to a decrease in the thermal properties and only the char yield values increase with the increase in the POSS-H content in the PU-POSS hybrids. The XRD pattern reveals that the crystalline structure of POSS molecules are destroyed by the polymer matrices in the PU-POSS hybrid films. The decrease in the bending storage modulus E' values with the increase in the POSS-H content proves the retardation of hydrogen bonding formation by the POSS-H molecule in the PU-POSS hybrid.
机译:通过FTIR,TGA,扫描电子显微镜(SEM),X射线衍射(XRD)和DMA技术研究了含有17.5重量%的倍半硅氧烷的聚氨酯纳米复合物中完全缩合和不完全缩聚的倍半硅氧烷的结构性质。 FTIR光谱表明PU-POSS系统中存在氢键。氢键的强度随POSS-H负载的增加而降低,这表明通过添加POSS-H分子可防止氢键形成。 SEM分析显示,在PU-POSS基质中添加POSS-H分子后,表现出更大程度的相分离和大量POSS聚集的PU基质中的POSS-H分子不相容。 TGA热分析图表明,POSS-PU杂种具有出色的热稳定性。然而,POSS-H分子的掺入导致热性质的降低,并且仅焦炭产率值随着PU-POSS杂种中POSS-H含量的增加而增加。 XRD图谱表明,POSS分子的晶体结构被PU-POSS杂化膜中的聚合物基质破坏。弯曲储能模量E'值随POSS-H含量的增加而降低,证明了PU-POSS杂化物中POSS-H分子氢键形成的延迟。

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