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A Case Study of ALD Encapsulation of Quantum Dots: Embedding Supported CdSe/CdS/ZnS Quantum Dots in a ZnO Matrix

机译:ALD量子点封装的案例研究:将支持的CdSe / CdS / ZnS量子点嵌入ZnO矩阵

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We study the encapsulation of monolayers of CdSe/CdS/ZnS core/shell/shell quantum dots (QDs) in a ZnO matrix by atomic layer deposition (ALD) in order to gain insight in the interaction between quantum dots and ALD precursors and the resulting metal oxide coating. Using in situ XRF and GISAXS, we show the inhibition of ZnO growth on as-deposited QDs. Growth can, however, be triggered by exposing the QDs to a single pulse of trimethylaluminum (TMA) vapor. Such a TMA pretreatment results in the substitution of 35-40% of the surface Zn by Al. Whereas this drops by half the photoluminescence quantum yield of the QDs, we argue that this replacement primes the QD monolayer for ZnO growth by ALD. Finally, the evolution of the GISAXS pattern during subsequent ALD growth attests the preservation of the ordering of the QDs in the monolayer. These results illustrate the important interplay between highly reactive ALD precursors and the QD surface.
机译:我们通过原子层沉积(ALD)研究ZnO基质中CdSe / CdS / ZnS核/壳/壳量子点(QDs)单层的封装,以了解量子点和ALD前驱物之间的相互作用以及由此产生的结果金属氧化物涂层。使用原位XRF和GISAXS,我们显示了对沉积的QD上ZnO生长的抑制作用。但是,可以通过将QD暴露在三甲基铝(TMA)蒸气的单个脉冲中来触发生长。这种TMA预处理导致Al替代了表面Zn的35-40%。尽管这使QD的光致发光量子产率下降了一半,但我们认为这种替代引发了ALD引发QD单层的ZnO生长。最后,在随后的ALD增长期间GISAXS模式的演变证明了QD在单层中的有序性得以保留。这些结果说明了高反应性ALD前体与QD表面之间的重要相互作用。

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