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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Nanocrystal Formation in Silicon Oxy-Nitride Films for Photovoltaic Applications: Optical and Electrical Properties
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Nanocrystal Formation in Silicon Oxy-Nitride Films for Photovoltaic Applications: Optical and Electrical Properties

机译:用于光伏应用的氮氧化硅薄膜中的纳米晶体形成:光学和电学性质

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摘要

Thin films of nanocrystalline SiOxNy are studied in view of their application in silicon heterojunction (SHJ) solar cells. In particular, the formation of the nanocrystals and their effects on the electrical and optical properties of the films are investigated. The role of the oxygen content on the properties of the layers is clarified as well. The obtained layers show very high conductivity (44 S/cm), low activation energy (1.85 meV) and high Tauc gap (2.5 eV), promising features for their application in photovoltaics.
机译:鉴于其在硅异质结(SHJ)太阳能电池中的应用,研究了纳米SiOxNy薄膜。特别地,研究了纳米晶体的形成及其对膜的电学和光学性质的影响。还阐明了氧含量对层的性能的作用。所获得的层显示出非常高的电导率(44 S / cm),低活化能(1.85 meV)和高Tauc间隙(2.5 eV),有望将其应用于光伏技术。

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