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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Effects of Pressure, Thermal Treatment, and O-2 Loading in MCM41, MSU-H, and MSU-F Mesoporous Silica Systems Probed by Raman Spectroscopy
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Effects of Pressure, Thermal Treatment, and O-2 Loading in MCM41, MSU-H, and MSU-F Mesoporous Silica Systems Probed by Raman Spectroscopy

机译:拉曼光谱探测MCM41,MSU-H和MSU-F中孔二氧化硅系统中压力,热处理和O-2负载的影响

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摘要

We present a Raman study of the effects induced by pressure, thermal treatments, and O-2 loading in MCM41, MSU-H, and MSU-F representative mesoporous silica. We compared the starting powders with the mechanically pressed tablets produced applying pressures of similar to 0.2 and similar to 0.45 GPa. The spectra of the three untreated tablets evidence that the main value of the Si-O-Si angle decreases and that in the MCM41 and the MSU-H Si-O-Si hydrolysis occurs, whereas such a process is absent or much less efficient in the MSU-F. Despite their different networks, the three powders tend to crystallize in cristobalite when treatments are at 1000 degrees C. The MCM41 and MSU-H tablets exhibit behavior similar to their starting powders, whereas the MSU-F tablets tend to form the tridymite crystalline phase. Such a finding could be related by the differences in the Si-O-Si hydrolysis, occurring during the tablets production. Finally, we inserted O-2 molecules within the interstices of the SiO2 wall only in MSU-F. By monitoring the O-2 content as a function of the delay time from the loading end, we provide evidence that the O-2 remains in the interstices for a sufficiently large time to modify the material properties by inserting small molecules and not only through the surface functionalization.
机译:我们介绍了拉曼研究的压力,热处理和M-2 41,MSU-H和MSU-F代表介孔二氧化硅中的O-2负载引起的影响。我们将起始粉末与施加压力接近0.2和0.45 GPa的机械压片进行了比较。三种未经处理的片剂的光谱表明,Si-O-Si角的主值减小,并且在MCM41和MSU-H Si-O-Si水解中发生,而这种方法不存在或效率低得多。 MSU-F。尽管它们的网络不同,但当在1000摄氏度的温度下进行处理时,这三种粉末往往在方石英中结晶.MCM41和MSU-H片剂表现出与起始粉末相似的行为,而MSU-F片剂则倾向于形成鳞闪石结晶相。这种发现可能与片剂生产过程中发生的Si-O-Si水解差异有关。最后,我们仅在MSU-F中将O-2分子插入SiO2壁的空隙中。通过监测O-2含量与从装料端开始的延迟时间之间的关系,我们提供了证据,表明O-2在空隙中保留的时间足够长,可以通过插入小分子而不只是通过小分子来改变材料性能。表面功能化。

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