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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Understanding Copper Activation and Xanthate Adsorption on Sphalerite by Time-of-Flight Secondary Ion Mass Spectrometry, X-ray Photoelectron Spectroscopy, and in Situ Scanning Electrochemical Microscopy
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Understanding Copper Activation and Xanthate Adsorption on Sphalerite by Time-of-Flight Secondary Ion Mass Spectrometry, X-ray Photoelectron Spectroscopy, and in Situ Scanning Electrochemical Microscopy

机译:通过飞行时间二次离子质谱,X射线光电子能谱和原位扫描电化学显微镜了解闪锌矿上的铜活化和黄药吸附

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In situ scanning electrochemical microscopy (SECM) was applied for the first time to study the copper activation and subsequent xanthate adsorption on sphalerite. The corresponding surface compositions were analyzed by time-of-flight secondary ion mass spectrometry (ToF-SIMS) and X-ray photoelectron spectroscopy (XPS). The probe approach curve (PAC) using SECM shows that unactivated and activated sphalerite surfaces have negative current feedback and partially positive current feedback, respectively, suggesting that Cu_xS is formed on the sphalerite after copper activation. The copper activation of sphalerite strongly depends on the surface heterogeneity (e.g., presence of polishing defects, chemical composition), impacting the subsequent xanthate adsorption process. The SECM, ToF-SIMS, and XPS analyses show that during the copper activation the polishing defects, which have high excess surface energy, tend to consume more copper ions, resulting in Cu-rich regions by forming CuS-like species, while Fe oxide/ hydroxide forms at Fe-rich regions. The XPS spectra further confirm that the CuS-like species involve Cu(I) and S(—I). The SECM imaging shows that after xanthate adsorption the current response at the Cu-rich regions decreases because of the formation of cuprous xanthate (CuX) and dixanfhogen (X2) while increases at the Fe-rich regions mainly due to the chemisorption of xanthate on Fe oxide/hydroxide. Our results shed light on the fundamental understanding of the electrochemical processes on sphalerite surface associated with its copper activation and subsequent xanthate adsorption in flotation.
机译:首次应用原位扫描电化学显微镜(SECM)来研究铜的活化以及随后的黄药在闪锌矿上的吸附。通过飞行时间二次离子质谱(ToF-SIMS)和X射线光电子能谱(XPS)分析相应的表面成分。使用SECM的探针逼近曲线(PAC)显示未活化和活化的闪锌矿表面分别具有负电流反馈和部分正电流反馈,表明Cu_xS在铜活化后形成在闪锌矿上。闪锌矿的铜活化在很大程度上取决于表面的不均匀性(例如,抛光缺陷的存在,化学成分),从而影响随后的黄药吸附过程。 SECM,ToF-SIMS和XPS分析表明,在铜活化过程中,具有较高过剩表面能的抛光缺陷往往会消耗更多的铜离子,从而通过形成类似CuS的物质而形成富铜区域,而氧化铁氢氧化物在富铁区域形成。 XPS光谱进一步证实,类似于CuS的物种涉及Cu(I)和S(-I)。 SECM成像表明,在黄药吸附后,由于形成了黄药酸铜(CuX)和双黄原素(X2),富铜区的电流响应降低,而富铁区的电流响应则增加,这主要是由于黄药对铁的化学吸附。氧化物/氢氧化物。我们的结果揭示了对闪锌矿表面上的电化学过程的基本认识,该过程与铜的活化以及随后浮选中的黄药吸附有关。

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