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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Negative Differential Resistance of Oligo(Phenylene Ethynylene) Self-Assembled Monolayer Systems: The Electric-Field-lnduced Conformational Change Mechanism
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Negative Differential Resistance of Oligo(Phenylene Ethynylene) Self-Assembled Monolayer Systems: The Electric-Field-lnduced Conformational Change Mechanism

机译:低聚(亚苯基乙炔)自组装单层系统的负微分电阻:电场诱导的构象变化机制

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摘要

We investigate here a possible mechanism for the room temperature negative differential resistance (NDR) in the Au/AN-OPE/RS/Hg self-assembled monolayer (SAM) system, where AN-OPE = 2'-amino,5'-nitro-oligo(phenylene ethynylene) and RS is a C_(14) alkyl thiolate. Kiehl and co-workers showed that this molecular system leads to NDR with hysteresis and sweep-rate-dependent position and amplitude in the NDR peak. To investigate a molecular basis for this interesting behavior, we combine first-principles quantum mechanics (QM) and mesoscale lattice Monte Carlo methods to simulate the switching as a function of voltage and voltage rate, leading to results consistent with experimental observations. This simulation shows how the structural changes at the microscopic level lead to the NDR and sweep-rate-dependent macroscopic I—V curve observed experimentally, suggesting a microscopic model that might aid in designing improved NDR systems.
机译:我们在这里研究Au / AN-OPE / RS / Hg自组装单层(SAM)系统中室温负差分电阻(NDR)的可能机制,其中AN-OPE = 2'-amino,5'-nitro -低聚(亚苯基亚乙炔基),RS是C(14)烷基硫醇盐。 Kiehl及其同事表明,该分子系统导致NDR出现滞后,并且在NDR峰中具有取决于扫描速率的位置和幅度。为了研究这种有趣行为的分子基础,我们结合了第一性原理量子力学(QM)和中尺度晶格蒙特卡洛方法来模拟作为电压和电压速率的函数的开关,从而得出与实验观察结果一致的结果。该模拟显示了在微观水平上的结构变化如何导致实验观察到的NDR和扫描速率相关的宏观I-V曲线,这表明可能有助于设计改进的NDR系统的微观模型。

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