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首页> 外文期刊>The Journal of Chemical Physics >Enhanced von Weizs?cker Wang-Govind-Carter kinetic energy density functional for semiconductors
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Enhanced von Weizs?cker Wang-Govind-Carter kinetic energy density functional for semiconductors

机译:半导体的增强型冯·韦兹克尔·旺格文-卡特动能密度函数

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摘要

We propose a new form of orbital-free (OF) kinetic energy density functional (KEDF) for semiconductors that is based on the Wang-Govind-Carter (WGC99) nonlocal KEDF. We enhance within the latter the semi-local von Weizs?cker KEDF term, which is exact for a single orbital. The enhancement factor we introduce is related to the extent to which the electron density is localized. The accuracy of the new KEDF is benchmarked against Kohn-Sham density functional theory (KSDFT) by comparing predicted energy differences between phases, equilibrium volumes, and bulk moduli for various semiconductors, along with metal-insulator phase transition pressures. We also compare point defect and (100) surface energies in silicon for a broad test of its applicability. This new KEDF accurately reproduces the exact non-interacting kinetic energy of KSDFT with only one additional adjustable parameter beyond the three parameters in the WGC99 KEDF; it exhibits good transferability between semiconducting to metallic silicon phases and between various III-V semiconductors without parameter adjustment. Overall, this KEDF is more accurate than previously proposed OF KEDFs (e.g., the Huang-Carter (HC) KEDF) for semiconductors, while the computational efficiency remains at the level of theWGC99 KEDF (several hundred times faster than the HC KEDF). This accurate, fast, and transferable new KEDF holds considerable promise for large-scale OFDFT simulations of metallic through semiconducting materials.
机译:我们提出了一种基于Wang-Govind-Carter(WGC99)非局域KEDF的新型无轨道(OF)动能密度函数(KEDF)。我们在后者中增强了半局部的von Weizs?cker KEDF项,该项对于单个轨道是精确的。我们引入的增强因子与电子密度的局部化程度有关。通过比较各种半导体的相,平衡体积和体模之间的预测能量差以及金属-绝缘体的相变压力,新的KEDF的准确度以Kohn-Sham密度泛函理论(KSDFT)为基准。我们还比较了硅中的点缺陷和(100)表面能,以广泛测试其适用性。这款新的KEDF仅在WGC99 KEDF中的三个参数之外,仅使用一个额外的可调参数即可精确地再现KSDFT的精确非相互作用动能;它在半导体到金属硅相之间以及各种III-V半导体之间显示出良好的可传递性,而无需调整参数。总体而言,此KEDF比先前提出的用于半导体的OF KEDF(例如,黄卡特(HC)KEDF)更准确,而计算效率保持在WGC99 KEDF的水平上(比HC KEDF快几百倍)。这种精确,快速和可转移的新型KEDF为金属到半导体材料的大规模OFDFT模拟提供了巨大的希望。

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