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Hirshfeld density partitioning technique: A first application to the transition metal compounds, HScO, TiO, VO

机译:Hirshfeld密度分配技术:首次应用于过渡金属化合物HScO,TiO,VO

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摘要

We apply a variant of the Hirshfeld density partitioning technique, HI, to calculate the atomic charges and decompose the dipole moments into the part due to the charges and the induced dipoles developed on each atom for three different transition metal (TM) containing molecules. Additionally, the α and β spin densities are treated separately developing a new variant (spin-adapted HI) of the fractional occupation HI version proposed recently. We also study the dependence of HI charges on the atomic state of the TM employed in the promolecule. The VO case exhibits a strong dependence of the atomic charge on the V or V~+ state used. Although the bonding in the ground high spin electronic state and the first excited low spin state in TiO and VO is essentially identical, the dipole moments differ significantly and we find that this is due entirely to the σ electron distribution localized on the transition metal. Finally, the mechanism for the rapid change of the dipole moment of HScO upon bending is confirmed to occur mainly due to the induced atomic charges.
机译:我们应用了Hirshfeld密度分配技术HI的一种变体来计算原子电荷,并由于电荷和每个包含三个不同过渡金属(TM)的分子在每个原子上形成的感应偶极子,将偶极矩分解为该部分。此外,α和β自旋密度分别进行处理,从而开发出了最近提出的分数职业HI版本的新变体(适应自旋的HI)。我们还研究了HI电荷对前分子中所用TM原子状态的依赖性。 VO情况显示出原子电荷对所用V或V〜+状态的强烈依赖性。尽管基态高自旋电子态与TiO和VO中的第一激发低自旋态的键合基本相同,但偶极矩有很大不同,我们发现这完全是由于过渡金属上的σ电子分布所致。最后,确认了HScO弯曲时偶极矩快速变化的机理主要是由于感应原子电荷引起的。

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