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Energy level alignment at organic semiconductor/metal interfaces: Effect of polar self-assembled monolayers at the interface

机译:有机半导体/金属界面处的能级对准:界面处极性自组装单分子层的影响

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We determined the shifts in the energy levels of similar to 15 nm thick poly[2-methoxy-5-(2(')-ethyl-hexyloxy)-1,4-phenylene vinylene] films deposited on various substrates including self-assembled monolayer (SAM) modified Au surfaces using photoelectron spectroscopy. As the unmodified substrates included Au, indium tin oxide, Si (with native oxide), and Al (with native oxide), a systematic shift in the detected energy levels of the organic semiconductor was observed to follow the work function values of the substrates. Furthermore, we used polar SAMs to alter the work function of the Au substrates. This suggests the opportunity to control the energy level positions of the organic semiconductor with respect to the electrode Fermi level. Photoelectron spectroscopy results showed that, by introducing SAMs on the Au surface, we successfully increased and decreased the effective work function of Au surface. We found that in this case, the change in the effective work function of the metal surface was not reflected as a shift in the energy levels of the organic semiconductor, as opposed to the results achieved with different substrate materials. Our study showed that when a substrate is modified by SAMs (or similarly by any adsorbed molecules), a new effective work function value is achieved; however, it does not necessarily imply that the new modified surface will behave similar to a different metal where the work function is equal to the effective work function of the modified surface. Various models and their possible contribution to this result are discussed. (c) 2008 American Institute of Physics.
机译:我们确定了类似于沉积在包括自组装单层在内的各种基板上的15 nm厚的聚[2-甲氧基-5-(2(')-乙基己氧基)-1,4-亚苯基亚乙烯基]薄膜的能级位移(SAM)修饰的Au表面,使用光电子能谱。由于未改性的基材包括Au,氧化铟锡,Si(具有天然氧化物)和Al(具有天然氧化物),因此观察到的有机半导体能级的系统偏移遵循了基材的功函数值。此外,我们使用极性SAM来改变Au基底的功函数。这表明有机会控制相对于电极费米能级的有机半导体的能级位置。光电子光谱结果表明,通过在金表面上引入SAM,我们成功地增加和降低了金表面的有效功函数。我们发现,在这种情况下,与使用不同基板材料获得的结果相反,金属表面有效功函数的变化并未反映为有机半导体能级的变化。我们的研究表明,当基质被SAM(或类似地被任何吸附的分子)修饰时,可获得新的有效功函数值。但是,这不一定意味着新的改性表面的行为类似于另一种金属,其中功函等于改性表面的有效功函。讨论了各种模型及其对这一结果的可能贡献。 (c)2008年美国物理研究所。

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