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Photoluminescence from C_(60)-coupled porous structures formed on Fe~+-implanted silicon

机译:Fe_ +注入硅上形成的C_(60)耦合多孔结构的光致发光

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(111)-oriented p-type Si wafer with a resistivity of 1-5 OMEGA cm was implanted with Fe~+ and then annealed at 1100 deg C in N_2 for 60 min,followed by anodization in a solution of HF to form porous structure with beta-FeSi_2 nanocrystallites.Photoluminescence (PL) spectral measurements show that a strong PL peak appears in the range of 610-670 nm.The position of the PL peak remains unchanged,but its intensity increases with the storage time in air until about three months and then saturates.C_(60) molecules were chemically coupled on the porous structure through a kind of silane coupling agent to form a nanocomposite.It is revealed that the stable PL peak monotonically shifts to a pinning wavelength at 570 nm.Experimental results from PL,PL excitation,Raman scattering,and x-ray diffraction measurements clearly show that the pinned PL originates from optical transition in C_(60)-related defect states,whereas the photoexcited carriers occur in the beta-FeSi_2 nanocrystallites formed during anodization.This work opens a new way to tailor nanometer environment for seeking optimal luminescent properties.
机译:电阻率为1-5 OMEGA cm的(111)取向p型Si晶片注入Fe〜+,然后在N_2中于1100℃退火60分钟,随后在HF溶液中进行阳极氧化以形成多孔结构β-FeSi_2纳米晶体。光致发光(PL)光谱测量表明,一个强PL峰出现在610-670 nm范围内。PL峰的位置保持不变,但其强度随在空气中的储存时间而增加,直至约3 C_(60)分子通过一种硅烷偶联剂在多孔结构上化学偶联形成纳米复合材料,结果表明稳定的PL峰单调移至570 nm的钉扎波长。 PL,PL激发,拉曼散射和X射线衍射测量清楚地表明,固定的PL起源于C_(60)相关缺陷态的光学跃迁,而光激发载流子出现在形成的β-FeSi_2纳米微晶中这项工作为调整纳米环境以寻求最佳发光性能开辟了一条新途径。

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