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首页> 外文期刊>The International Journal of Advanced Manufacturing Technology >Comparison of bending fracture strength of silicon after ablation with nanosecond and picosecond lasers
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Comparison of bending fracture strength of silicon after ablation with nanosecond and picosecond lasers

机译:纳秒和皮秒激光烧蚀后硅的弯曲断裂强度比较

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摘要

The demands of drilling on silicon wafers in multi-chip packages (MCPs) that employ laser ablation have increased. In this study, the bending fracture strengths of silicon specimens were experimentally measured using a four-point bending test after ablation with nanosecond and picosecond lasers. The specimens drilled with the picosecond laser showed a mean bending fracture strength (1530 MPa) higher than that of the specimens drilled with the nanosecond laser (678 MPa). One reason for this difference is that the cross-sectional roughnesses of the specimens drilled with the picosecond laser were less than those of the samples drilled with the nanosecond laser. Consequently, for the purpose of MCP interconnections, silicon wafer drilling with a picosecond laser is preferable to drilling with a nanosecond laser since the former yields greater bending fracture strength.
机译:在采用激光烧蚀的多芯片封装(MCP)中的硅晶片上钻孔的需求已经增加。在这项研究中,硅样品的弯曲断裂强度是用纳秒和皮秒激光烧蚀后的四点弯曲试验通过实验测量的。皮秒激光钻孔的样品的平均弯曲断裂强度(1530 MPa)高于纳秒激光钻孔的样品(678 MPa)。这种差异的一个原因是,皮秒激光钻孔的样品的横截面粗糙度小于纳秒激光钻孔的样品的横截面粗糙度。因此,出于MCP互连的目的,使用皮秒激光进行硅晶片钻孔优于使用纳秒激光进行钻孔,因为前者可产生更大的弯曲断裂强度。

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