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Determination of silicon and aluminum in silicon carbide nanocrystals by high-resolution continuum source graphite furnace atomic absorption spectrometry

机译:高分辨率连续源石墨炉原子吸收光谱法测定碳化硅纳米晶体中的硅和铝

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The determination of Al contaminant and the main component Si in silicon carbide (SiC) nanocrystals with the size-distribution of 1-8 nm dispersed in an aqueous solution was developed using high-resolution continuum source graphite furnace atomic absorption spectrometry (HR-CS-GFAAS). The vaporization/atomization processes were investigated in a transversally heated graphite atomizer by evaporating solution samples of Al and Si preserved in various media (HCl, HNO3). For Si, the best results were obtained by applying a mixture of 5 mu g Pd plus 5 mu g Mg, whereas for Al, 10 mu g Mg (each as nitrate solution) was dispensed with the samples, but the results obtained without modifier were found to be better. This way a maximum pyrolysis temperature of 1200 degrees C for Si and 1300 degrees C for Al could be used, and the optimum (compromise) atomization temperature was 2400 degrees C for both analytes. The Si and Al contents of different sized SiC nanocrystals, dispersed in aqueous solutions, were determined against aqueous (external) calibration standards. The correlation coefficients (R values) of the calibrations were found to be 0.9963 for Si and 0.9991 for Al. The upper limit of the linear calibration range was 2 mg/l Si and 0.25 mg/l Al. The limit of detection was 3 mu g/l for Si and 0.5 mu g/l for Al. The characteristic mass (m(0)) was calculated to be 389 pg Si and 6.4 pg Al. The Si and Al content in the solution samples were found to be in the range of 1.0-1.7 mg/l and 0.1-0.25 mg/l, respectively. (C) 2015 Elsevier B.V. All rights reserved.
机译:使用高分辨率连续谱源石墨炉原子吸收光谱法(HR-CS-S)建立了大小分布为1-8 nm分散在水溶液中的碳化硅(SiC)纳米晶体中Al污染物和主要成分Si的测定方法GFAAS)。在横向加热的石墨雾化器中,通过蒸发保存在各种介质(HCl,HNO3)中的Al和Si的溶液样品,研究了汽化/雾化过程。对于Si,通过使用5μgPd和5μgMg的混合物获得最佳结果,而对于Al,将10μgMg(每种作为硝酸盐溶液)分配到样品中,但是在没有改性剂的情况下获得的结果是发现更好。这样,可以使用Si的最高热解温度为1200℃,Al的最高热解温度为1300℃,两种分析物的最佳(折衷)雾化温度均为2400℃。根据水溶液(外部)校准标准测定分散在水溶液中的不同尺寸的SiC纳米晶体的Si和Al含量。校准的相关系数(R值)对于Si为0.9963,对于Al为0.9991。线性校准范围的上限为2 mg / l Si和0.25 mg / l Al。硅的检出限为3微克/升,铝的检出限为0.5微克/升。计算出特征质量(m(0))为389 pg Si和6.4 pg Al。发现溶液样品中的Si和Al含量分别在1.0-1.7mg / l和0.1-0.25mg / l的范围内。 (C)2015 Elsevier B.V.保留所有权利。

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