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Efficient multi-keV x-ray source generated by nanosecond laser pulse irradiated multi-layer thin foils target

机译:纳秒激光脉冲辐照的多层薄箔靶产生的高效多keV x射线源

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摘要

A new target configuration is proposed to generate efficient multi-keV x-ray source using multiple thin foils as x-ray emitters. The target was constructed with several layers of thin foils, which were placed with a specific, optimized spacing. The thin foils are burned though one by one by a nanosecond-long laser pulse, which produced a very large, hot, underdense plasma. One-dimensional radiation hydrodynamic simulations show that the emission region and the multi-keV x-ray flux generated by multi-layer thin foil target are similar to that of the low-density gas or foam target, which is currently a bright multi-keV x-ray source generated by laser heating. Detailed analysis of a range of foil thicknesses showed that a layer-thickness of 0.1 μm is thin enough to generate an efficient multi-keV x-ray source. Additionally, this type of target can be easily manufactured, compared with the complex techniques for fabrication of low-density foam targets. Our preliminary experimental results also verified that the size of multi-keV x-ray emission region could be enhanced significantly by using a multi-layer Ti thin foil target.
机译:提出了一种新的目标配置,以使用多个薄箔片作为X射线发射器来生成有效的多KeV X射线源。该靶标由几层薄箔构成,并以特定的优化间距放置。纳秒长的激光脉冲将薄箔逐一燃烧,从而产生非常大的,热的,致密的等离子体。一维辐射流体动力学模拟表明,多层薄箔靶产生的发射区域和多keV x射线通量与低密度气体或泡沫靶相似,目前是明亮的多keV激光加热产生的X射线源。对一系列箔厚度的详细分析表明,0.1μm的层厚度足够薄,足以产生高效的多keV x射线源。另外,与用于制造低密度泡沫靶的复杂技术相比,可以容易地制造这种类型的靶。我们的初步实验结果还证实,通过使用多层Ti薄箔靶,可以显着增加多KeV X射线发射区域的大小。

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