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首页> 外文期刊>Physical Review, B. Condensed Matter >Residual strain in Ge pyramids on Si(111) investigated by x-ray crystal truncation rod scattering
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Residual strain in Ge pyramids on Si(111) investigated by x-ray crystal truncation rod scattering

机译:X射线晶体截断杆散射研究Si(111)上Ge金字塔中的残余应变

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Epitaxial growth of germanium on boron-terminated Si(111) results in the formation of triangular pyramidal Ge islands which are partially relaxed. We show that the termination of the Si(111) surface with 1/3 ML of boron is essential for the formation of faceted islands,We have investigated the residual strain in the Ge islands using x-ray crystal truncation rod scattering, and developed an analytical expression for the scattered intensity from islands with a nonuniform lattice parameter. We compare the measured intensity to x-ray scattering profiles calculated on the basis of different strain models. It is found that the Ge lateral lattice parameter changes linearly from the bottom to the top of the islands. [References: 40]
机译:锗在硼终止的Si(111)上外延生长导致形成三角形金字塔形Ge岛,该岛部分松弛。我们表明用1/3 ML的硼终止Si(111)表面对于形成刻面岛至关重要,我们使用x射线晶体截断棒散射研究了Ge岛中的残余应变,并开发了一种具有非均匀晶格参数的岛的散射强度的解析表达式。我们将测得的强度与根据不同应变模型计算出的X射线散射曲线进行比较。发现Ge横向晶格参数从岛的底部到顶部线性地变化。 [参考:40]

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