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Positron affinity in semiconductors: Theoretical and experimental studies

机译:半导体中的正电子亲和力:理论和实验研究

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Knowledge of the positron affinity A(+ ,) a basic hulk characteristic of materials, is important to the understanding of positron trapping at interfaces and at precipitates. Theoretical calculations of A(+) for 3C, 4H, and 6H polytypes of SiC, based on various approaches to electron-positron correlations within the local-density approximation and the generalized gradient approximation for positrons, are compared with experimental values obtained via work-function measurements. The disagreement between theoretical and experimental values of A(+) is discussed in terms of difficulties in the precise measurement of the positron work function and the possible inadequacy of contemporary approaches to electron-positron correlation in semiconductors. [S0163-1829(99)02303-6]. [References: 39]
机译:正电子亲和力A(+,)是材料的基本绿巨人特性的知识,对于理解界面和沉淀物上的正电子陷阱非常重要。 SiC的3C,4H和6H多型A(+)的理论计算,基于对正电子的局部密度近似和广义梯度近似中的电子-正电子相关性的各种方法,与通过工作获得的实验值进行了比较-功能测量。讨论了A(+)的理论值和实验值之间的分歧,这是因为在精确测量正电子功函数方面的困难以及半导体中电子-正电子相关性的现代方法可能存在的不足。 [S0163-1829(99)02303-6]。 [参考:39]

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