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首页> 外文期刊>Physical Review, B. Condensed Matter >Doping-induced metal-insulator transition in two-dimensional Hubbard t-U and extended Hubbard t-U-W models
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Doping-induced metal-insulator transition in two-dimensional Hubbard t-U and extended Hubbard t-U-W models

机译:二维Hubbard t-U模型和扩展Hubbard t-U-W模型中的掺杂诱导的金属-绝缘体转变

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We show numerically that the nature of the doping-induced metal-insulator transition in the two-dimensional Hubbard model with hopping matrix element t and Coulomb repulsion U is radically altered by the inclusion of a term W that depends upon a square of a single-particle nearest-neighbor hopping. This result is reached by computing the localization length xi(l), in the insulating state. At W/t = 0.05 and U/t = 4, we find results consistent with xi(l)similar tomu - mu(c)(-1/2) where mu(c) is the critical chemical potential. In contrast, xi(l)similar tomu - mu(c)(-1/4) for the Hubbard model at U/t = 4, At half-filling, we calculate the density of states N(omega). The large value of N(omega) in the vicinity of w = mu(c) present at W = 0 is suppressed with growing values of W. At finite doping, the d-wave pair-field correlations are enhanced with growing values of W. The numerical results imply that at finite values of W doping the antiferromagnetic Mott insulator leads to a d(x2-y2) superconductor. [References: 28]
机译:我们从数值上显示,在包含跳变矩阵元素t和库仑斥力U的二维Hubbard模型中,掺杂诱导的金属-绝缘体跃迁的性质通过包含项W进行了根本改变,项W取决于单原子的平方。粒子最近邻居跳跃。通过计算绝缘状态下的定位长度xi(l)可获得此结果。在W / t = 0.05且U / t = 4时,我们发现与xi(l)一致的结果类似于 mu-mu(c)(-1/2),其中mu(c)是关键化学势。相反,对于U / t = 4的Hubbard模型,xi(l)类似于 mu-mu(c)(-1/4),在半填充时,我们计算状态的密度N(ω)。随着W的增大,W = 0处存在的w = mu(c)附近的N(ω)的大值被抑制。在有限掺杂下,随着W的增大,d波对场相关性增强。数值结果表明,在W的有限值掺杂下,反铁磁Mott绝缘子会导致ad(x2-y2)超导体。 [参考:28]

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