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Study of the influence of substrate temperature on structural, optical, and electrical properties of Zn-doped MnIn2S4 thin films prepared by chemical spray pyrolysis

机译:研究衬底温度对化学喷雾热解制备Zn掺杂MnIn2S4薄膜的结构,光学和电学性质的影响

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The Zn-doped MnIn2S4 thin films were deposited by chemical spray pyrolysis technique on a heated glass substrate using the aqueous solution of MnCl2, InCl3, (NH2)(2)CS and ZnCl2. The thin films were grown at different substrate temperatures ranging from 250-400 degrees C. The synthesized films were characterized by X-ray diffraction (XRD), energy dispersive analysis spectrum (EDS), field emission scanning electron microscope (FESEM), UV-Vis absorption spectroscopy and four probe method. The XRD analysis indicates Zn-doped MnIn2S4 thin films were polycrystalline in nature with a cubic spinel structure having (101) plane as the preferred orientation. The structural parameters like crystalline size (D), dislocation density (8), strain (e) and lattice distortion (LD) have been evaluated from XRD results. The energy dispersive analysis spectrum (EDS) predicts the presence of Mn, In, S and Zn in the film grown at 250 degrees C. The formation of the needle and spherical shaped grains was clearly observed from FE-SEM analysis. From the optical studies, it is analyzed that about (88%) of light transmission occurs in the Vis-IR regions. It is interesting to note that the structural homogeneity and crystallinity of the films has improved due to the decrease in the absorption coefficient (alpha) and extinction coefficient (K) with an increase in substrate temperature. The calculated optical band gap energies increase (1.51-1.74 eV) with an increase of substrate temperatures. The photoluminescence (PL) spectrum reveals the presence of well-defined band edge (<400 nm) and defect emissions in the wavelength region around 400-650 nm. Moreover, from electrical studies, the electrical resistivity decreases with increase in substrate temperature and a minimum electrical resistivity of 1.20 x 10(3) Omega m was obtained for the film coated at 400 degrees C. The high absorption coefficient (a) in the order of 10(4) cm(-1) and high transmittance (88%) of the films makes them an efficient absorber and a good window layer in photovoltaic applications. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过化学喷雾热解技术,使用MnCl2,InCl3,(NH2)(2)CS和ZnCl2的水溶液,通过化学喷雾热解技术将Zn掺杂的MnIn2S4薄膜沉积在加热的玻璃基板上。薄膜在250-400摄氏度的不同衬底温度下生长。合成的薄膜通过X射线衍射(XRD),能量色散分析光谱(EDS),场发射扫描电子显微镜(FESEM),UV-可见吸收光谱法和四探针法。 XRD分析表明,Zn掺杂的MnIn 2 S 4薄膜本质上是多晶的,具有(101)面作为优选取向的立方尖晶石结构。结构参数,如晶体尺寸(D),位错密度(8),应变(e)和晶格畸变(LD)已从XRD结果进行了评估。能量色散分析光谱(EDS)预测在250摄氏度下生长的薄膜中存在Mn,In,S和Zn。通过FE-SEM分析可以清楚地观察到针状和球形晶粒的形成。从光学研究中,分析出大约(88%)的光透射发生在Vis-IR区域。有趣的是,薄膜的结构均匀性和结晶度由于衬底温度升高而导致的吸收系数α和消光系数(K)减小而得到改善。随着基板温度的升高,计算出的光学带隙能量会增加(1.51-1.74 eV)。光致发光(PL)光谱显示在400-650 nm左右的波长区域中存在明确定义的带边(<400 nm)和缺陷发射。此外,从电学研究来看,电阻率随基板温度的升高而降低,并且在400摄氏度下涂覆的薄膜的最小电阻率为1.20 x 10(3)Ωm。高吸收系数(a)依次为10(4)cm(-1)的薄膜和高透射率(88%)的薄膜使其成为光伏应用中的高效吸收剂和良好的窗口层。 (C)2016 Elsevier B.V.保留所有权利。

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