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首页> 外文期刊>Physics Letters, A >Plasma focus based flash hard X-ray source in the 100 keV region with reproducible spectrum
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Plasma focus based flash hard X-ray source in the 100 keV region with reproducible spectrum

机译:基于等离子聚焦的100 keV范围内的闪光硬X射线源具有可再现的光谱

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摘要

A pulsed hard X-ray source with shot to shot reproducible spectrum, based on a 4.7 kJ small-chamber Mather-type plasma focus device, is presented. The hard X-ray output spectrum was measured in a single shot basis by differential absorption on metallic plates. The measured spectra have a single dominant peak around 75 keV and a spectral bandwidth covering the 40-150 keV range. A hard X-ray dose of (53±3) μGy per shot was measured on axis at 53 cm from the source, and found to be uniform within a half aperture angle of 6°.
机译:提出了一种基于脉冲的硬X射线源,其具有可复制的,可复制的光谱,该光谱源基于4.7 kJ小室马瑟型等离子体聚焦装置。硬X射线输出光谱是通过在金属板上差分吸收以单次测量的方式测量的。测得的光谱在75 keV附近有一个主峰,光谱带宽覆盖40-150 keV。在距放射源53 cm的轴上测量了每次射击的(53±3)μGy硬X射线剂量,发现在6°的半孔径角内是均匀的。

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