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首页> 外文期刊>Physica, C. Superconductivity and its applications >J(C) properties and microstructures of YBCO films fabricated by low temperature calcination in TFA-MOD method
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J(C) properties and microstructures of YBCO films fabricated by low temperature calcination in TFA-MOD method

机译:用TFA-MOD法低温煅烧制备的YBCO薄膜的J(C)性能和微观结构

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摘要

YBa2Cu3O7-delta (YBCO) films were grown on LaAlO3 Substrates by a metal organic deposition using trifluoroacetates (TFA-MOD). In this study, effects of calcination condition such as temperature on microstructures and J(c) properties for the YBCO films were studied. The TFA starting solution was coated on a substrate by a spin-coating method. Then, a two-step heat treatment was applied to the coated films. In the calcination step, the coated film was calcined to form a homogeneous amorphous precursor by increasing the temperature which was varied from 300 degrees C to 500 degrees C at a constant heating rate of 2 degrees C/min. The prepared precursor films were crystallized at a constant condition. As a result,Jc value depended on the calcination temperature, YBCO film calcined at 400 degrees C showed the highest J(c) of 2.5 MA/cm(2). J(c)'s for the YBCO films calcined at 300 degrees C and 350 degrees C were 1.9 MA/cm(2) and 2.0 MA/cm(2), respectively. On the other hand, YBCO film calcined at 500 degrees C showed the lowest J(c) of 1.4 MA/cm(2). Cross-sectional TEM images showed that the YBCO film calcined at 400 degrees C had less pores and small size of pores in the crystallized film randomly throughout the film. Large pores were observed in the YBCO film calcined at 500 degrees C. Also, these large pores were existed near substrate in the YBCO film. It is considered that the differences of these pore formation mechanisms are the main cause of the difference of J(c) characteristic.
机译:通过使用三氟乙酸盐(TFA-MOD)的金属有机沉积,在LaAlO3基板上生长YBa2Cu3O7-δ(YBCO)膜。在这项研究中,研究了煅烧条件如温度对YBCO薄膜的微观结构和J(c)性能的影响。通过旋涂法将TFA起始溶液涂布在基材上。然后,对涂布膜进行两步热处理。在煅烧步骤中,通过以2℃/ min的恒定加热速率将温度从300℃变化至500℃,将涂膜煅烧以形成均匀的非晶态前体。所制备的前体膜在恒定条件下结晶。结果,Jc值取决于煅烧温度,在400℃下煅烧的YBCO膜显示出最高的J(c)为2.5MA / cm(2)。在300摄氏度和350摄氏度下煅烧的YBCO薄膜的J(c)分别为1.9 MA / cm(2)和2.0 MA / cm(2)。另一方面,在500摄氏度下煅烧的YBCO薄膜的最低J(c)为1.4 MA / cm(2)。截面TEM图像显示,在400℃下煅烧的YBCO膜在整个膜中随机地具有较少的孔并且在结晶的膜中具有较小的孔尺寸。在500℃下煅烧的YBCO膜中观察到大孔。而且,这些大孔存在于YBCO膜中的基板附近。认为这些孔形成机理的差异是J(c)特性差异的主要原因。

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