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Enhancement of QDs' fluorescence based on porous silicon Bragg mirror

机译:基于多孔硅布拉格镜增强量子点的荧光

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摘要

We fabricated a new porous silicon photonic device which is a special multi -layer porous silicon including two different single layer porous silicon and a porous silicon Bragg mirror, and investigated the influence of porous silicon Bragg mirror's structure on the fluorescence intensity of quantum dots (QDs) which infiltrated into porous silicon device, and CdSe/ZnS QDs we used emit at 605 nm and 625 nm respectively. By immersing porous silicon samples in QDs solution, QDs were successfully infiltrated into porous silicon devices which have high reflection band at or beyond fluorescence peak. Experimental results show that the fluorescence intensity of QDs which infiltrated into the first layer of porous silicon device can be enhanced when fluorescence peak falls into the high reflection band of porous silicon device. (C) 2014 Elsevier B.V. All rights reserved.
机译:我们制造了一种新型的多孔硅光子器件,该器件是一种特殊的多层多孔硅,包括两个不同的单层多孔硅和一个多孔硅布拉格镜,并研究了多孔硅布拉格镜的结构对量子点(QDs)荧光强度的影响)渗透到多孔硅器件中,我们使用的CdSe / ZnS QD分别在605 nm和625 nm处发射。通过将多孔硅样品浸入QDs溶液中,QD成功渗透到在荧光峰处或荧光峰以上具有高反射带的多孔硅器件中。实验结果表明,当荧光峰落入多孔硅器件的高反射带时,可以提高渗入多孔硅器件第一层的量子点的荧光强度。 (C)2014 Elsevier B.V.保留所有权利。

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