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首页> 外文期刊>Physica, B. Condensed Matter >Temperature dependence of the exchange coupling in CO/SI(or Ge)/Fe trilayers
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Temperature dependence of the exchange coupling in CO/SI(or Ge)/Fe trilayers

机译:CO / SI(或Ge)/ Fe三层中交换耦合的温度依赖性

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The temperature dependences of interfacial exchange coupling in Co/semiconductor (SM)/Fe trilayers (SM≡Si or Ge) with different spacer thicknesses are investigated. Only one step is found in the third (not in the first) quadrant of the hysteresis loop of the trilayers with different SM thicknesses, which is ascribed to a larger interfacial coupling strength of Co/CoGe (or Co/CoSi) than of Fe/FeGe (or Fe/FeSi). Furthermore, in comparison with Co/Ge/Fe, a smaller exchange bias field H_E and no clear step are observed in Co/Si/Fe, which may originate from the weaker interfacial coupling in this trilayer. The variation of coercivity H_C with spacer thickness at low temperatures in Co/Ge/Fe is different from that in Co/Si/Fe, indicating again the important effect of the SM layer in the trilayers.
机译:研究了不同间隔层厚度的Co /半导体(SM)/ Fe三层膜(SM≡Si或Ge)中界面交换耦合的温度依赖性。在具有不同SM厚度的三层磁滞回线的第三象限中,只有一个步骤被发现,这归因于Co / CoGe(或Co / CoSi)的界面耦合强度比Fe / FeGe(或Fe / FeSi)。此外,与Co / Ge / Fe相比,在Co / Si / Fe中观察到较小的交换偏压场H_E且没有清晰的台阶,这可能是由于该三层中较弱的界面耦合引起的。 Co / Ge / Fe中低温下矫顽力H_C随隔离层厚度的变化与Co / Si / Fe中的变化不同,这再次表明了SM层在三层中的重要作用。

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