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Native point defects in ZnS films

机译:ZnS薄膜中的自然点缺陷

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The native point defects structure in ZnS films obtained by the close-spaced vacuum sublimation technique at different growth conditions has been studied. The energy levels in the band gap were studied by the photoluminescence and injection spectroscopy under monopolar injection conditions.Luminescence spectra were recorded using electrical fluorometer in the range of wavelengths l=360–710nm under liquid-helium temperature. The point defects structure in the ZnS films was calculated using quasi-chemical formalism. Besides, in order to study the point defects dark voltage-current characteristics using the theory of space charge limited currents was investigated. As a result, dependences of concentration of free carriers and native point defects on technological growth conditions of ZnS films have been received. In the band gap of ZnS a range of localized states with different energy were revealed.
机译:研究了通过近距离真空升华技术在不同生长条件下获得的ZnS薄膜的本征点缺陷结构。在单极注入条件下,通过光致发光和注入光谱研究了带隙中的能级。在液氦温度下,使用电子荧光计在波长l = 360-710nm范围内记录了发光光谱。 ZnS薄膜中的点缺陷结构是使用准化学形式学计算的。此外,为了研究点缺陷,利用空间电荷限制电流理论研究了暗电压-电流特性。结果,已经收到了自由载流子浓度和自然点缺陷对ZnS膜技术生长条件的依赖性。在ZnS的带隙中,揭示了具有不同能量的一系列局部状态。

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